SCHEMBL13840917

SCHEMBL13840917

COc1ccc(OC(=O)C(F)(F)SOOO)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
PARP10 Q53GL7 2/20 0.40
PARP1 P09874 1/20 0.40
PARP2 Q9UGN5 1/20 0.40
PARP4 Q9UKK3 1/20 0.40
MAOB P27338 1/20 0.39
ELANE P08246 4/20 0.39
GAA P10253 4/20 0.38
CES2 O00748 1/20 0.38
CES1 P23141 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
LMNA P02545 2/20 0.37
CYP1A2 P05177 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
PDK1 Q15118 1/20 0.37
PDK2 Q15119 1/20 0.37
PDK3 Q15120 1/20 0.37
PDK4 Q16654 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2603100 0.84 ATM (0.40) PARP10MAOBELANEALDH1A1
SCHEMBL2603127 0.82 KMT2A (0.39) ELANEGAASMN1; SMN2LMNACYP1A2
SCHEMBL2603102 0.78 KMT2A (0.45) SMN1; SMN2CYP1A2ALDH1A1
SCHEMBL27746984 0.76 ELANE (0.48) CA1CA2PARP10PARP1PARP2
SCHEMBL2603132 0.76 MEN1 (0.46) GAASMN1; SMN2LMNAALDH1A1
SCHEMBL2602859 0.74 ALDH1A1 (0.33) ALDH1A1
SCHEMBL28486870 0.71 ELANE (0.50) CA1CA2MAOBELANEGAA
SCHEMBL14009342 0.70 ATM (0.42) PARP10MAOBELANEALDH1A1
SCHEMBL11596680 0.70 ELANE (0.73) CA1CA2ELANECES2CES1
SCHEMBL2602844 0.70 ALDH1A1 (0.36) MAOBELANEGAACYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed