Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | ELANE | P08246 | 5/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.35 |
| ▸ | NSD2 | O96028 | 1/20 | 0.35 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.35 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14009434 | 0.90 | HDAC1 (0.43) | TDP1ELANEKDM4EMAPTHDAC1 | |
| SCHEMBL2603100 | 0.86 | ATM (0.40) | ATML3MBTL1TDP1ELANEMAOB | |
| SCHEMBL14009328 | 0.82 | KMT2A (0.47) | L3MBTL1TDP1HSD17B10ALDH1A1KDM4E | |
| SCHEMBL2603127 | 0.78 | KMT2A (0.39) | TDP1ELANEKDM4EMAPTHDAC1 | |
| SCHEMBL1255890 | 0.77 | ELANE (0.47) | ATML3MBTL1TDP1ELANEMAOB | |
| SCHEMBL10946374 | 0.75 | ELANE (0.46) | ATML3MBTL1TDP1ELANEMAOB | |
| SCHEMBL544447 | 0.75 | MAOB (0.49) | ATML3MBTL1TDP1ELANEMAOB | |
| SCHEMBL14009407 | 0.75 | ALDH1A1 (0.47) | L3MBTL1TDP1ALDH1A1 | |
| SCHEMBL14009415 | 0.74 | HSD17B10 (0.48) | L3MBTL1TDP1HPGDHSD17B10ALDH1A1 | |
| SCHEMBL13840921 | 0.73 | MAOB (0.39) | ATML3MBTL1TDP1ELANEMAOB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080274426-A1 | Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-11-06 | — | — | US | disclosed |