SCHEMBL13840923

SCHEMBL13840923

O=C(Oc1cccc2ccccc12)C(F)(SOOO)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.43
HSD17B10 Q99714 3/20 0.43
GAA P10253 2/20 0.43
PGR P06401 1/20 0.43
PTGS1 P23219 1/20 0.43
MAPK1 P28482 1/20 0.43
KMT2A Q03164 3/20 0.43
MEN1 O00255 1/20 0.43
RAB9A P51151 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
KDM4E B2RXH2 3/20 0.41
HPGD P15428 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
MMP2 P08253 1/20 0.39
OGG1 O15527 1/20 0.38
FABP7 O15540 3/20 0.38
FABP3 P05413 3/20 0.38
FABP5 Q01469 3/20 0.38
BCHE P06276 1/20 0.38
SLC6A3 Q01959 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840937 0.87 ALDH1A1 (0.43) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL2603106 0.86 ALDH1A1 (0.46) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL13840927 0.84 ALDH1A1 (0.43) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL13840924 0.79 KMT2A (0.41) KMT2AMEN1KDM4EHPGDTDP1
SCHEMBL14009415 0.78 HSD17B10 (0.48) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL13840921 0.77 MAOB (0.39) ALDH1A1HSD17B10L3MBTL1KDM4EHPGD
SCHEMBL13840925 0.77 TRPV1 (0.39) ALDH1A1KMT2AMEN1KDM4ETDP1
SCHEMBL4082182 0.77 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL13840940 0.74 ALDH1A1 (0.43) ALDH1A1KMT2AMEN1RAB9AKDM4E
SCHEMBL12128703 0.74 ALDH1A1 (0.57) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7527910-B2 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-05 US disclosed
US-20070184382-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-08-09 US disclosed