SCHEMBL12128703

SCHEMBL12128703

CC(F)(F)C(=O)Oc1cccc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 4/20 0.57
▸ HSD17B10 Q99714 3/20 0.57
▸ GAA P10253 2/20 0.57
▸ PGR P06401 1/20 0.57
▸ PTGS1 P23219 1/20 0.57
▸ MAPK1 P28482 1/20 0.57
▸ KDM4E B2RXH2 3/20 0.55
▸ KMT2A Q03164 3/20 0.51
▸ MEN1 O00255 1/20 0.51
▸ RAB9A P51151 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.51
▸ HPGD P15428 2/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ MMP2 P08253 1/20 0.46
▸ FABP7 O15540 4/20 0.44
▸ FABP3 P05413 4/20 0.44
▸ FABP5 Q01469 4/20 0.44
▸ BCHE P06276 1/20 0.44
▸ SLC6A3 Q01959 1/20 0.44
▸ ELANE P08246 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4082182 0.86 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL1538258 0.86 ALDH1A1 (0.60) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL31748924 0.86 ALDH1A1 (0.60) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL7737365 0.83 ALDH1A1 (0.57) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL24360783 0.81 ALDH1A1 (0.56) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL7265465 0.81 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL11991243 0.81 ALDH1A1 (0.54) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL2605926 0.80 HSD17B10 (0.49) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL15114264 0.80 ALDH1A1 (0.49) ALDH1A1HSD17B10GAAPGRPTGS1
SCHEMBL28221287 0.80 ALDH1A1 (0.53) ALDH1A1HSD17B10GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8753802-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2014-06-17 — — US disclosed
US-20130045365-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-02-21 — — US disclosed
US-8062830-B2 Chemically amplified positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-11-22 — — US disclosed
US-20110189618-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-08-04 — — US disclosed
US-20110183264-A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-28 — — US disclosed
US-20110171586-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-07-14 — — US disclosed
US-20110091818-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 — — US disclosed
US-20110091820-A1 RESIST PROCESSING METHOD SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-21 — — US disclosed
Send feedback