SCHEMBL13840967

SCHEMBL13840967

CCC(C)(C)C(=O)OC1CCCS(=O)(=O)C1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.43
CYP1A2 P05177 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.35
CYP2D6 P10635 2/20 0.32
LMNA P02545 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
HRH1 P35367 1/20 0.32
KCNH2 Q12809 1/20 0.32
PIN1 Q13526 1/20 0.32
CYP19A1 P11511 1/20 0.32
EPHX1 P07099 1/20 0.32
RAB9A P51151 1/20 0.32
CYP3A4 P08684 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
HMGCR P04035 1/20 0.30
NAAA Q02083 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13840970 0.91 GAA (0.51) GAACYP1A2L3MBTL1PIN1SMN1; SMN2
SCHEMBL26467513 0.86 CYP1A2 (0.44) GAACYP1A2L3MBTL1SMN1; SMN2HMGCR
SCHEMBL26467548 0.81 GAA (0.40) GAACYP1A2L3MBTL1CHRM2CHRM1
SCHEMBL132134 0.80 EPHX1 (0.47) CHRM2CHRM1CHRM3HRH1KCNH2
SCHEMBL3435204 0.80 EPHX1 (0.43) CYP2D6LMNACHRM2CHRM1CHRM3
SCHEMBL108478 0.79 EPHX1 (0.50) CHRM3CYP19A1EPHX1RAB9ASMN1; SMN2
SCHEMBL20388945 0.79 EPHX1 (0.50) CHRM3CYP19A1EPHX1RAB9ASMN1; SMN2
SCHEMBL131561 0.79 EPHX1 (0.50) CHRM3CYP19A1EPHX1RAB9ASMN1; SMN2
SCHEMBL3434643 0.79 EPHX1 (0.50) CHRM3CYP19A1EPHX1RAB9ASMN1; SMN2
SCHEMBL26467519 0.77 CYP1A2 (0.51) GAACYP1A2L3MBTL1PIN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644751-B2 Resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2023-05-09 US disclosed
US-7537879-B2 Chemically amplified, sensitive to wavelengths (300 nm - 100 nm); comprises a novel polymer with a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and has acidic moiety protected with acid labile group, and a compound that producing an acid upon irradiation AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-05-26 US disclosed