SCHEMBL13845306

SCHEMBL13845306

CCCCCc1ccc(-c2ccc(OC(C)OCC)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.46
RAB9A P51151 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
RARB P10826 5/20 0.45
HSD17B10 Q99714 2/20 0.45
TSHR P16473 1/20 0.45
ALDH1A1 P00352 3/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
RARA P10276 1/20 0.44
MTOR P42345 1/20 0.44
PPARA Q07869 1/20 0.43
CASP3 P42574 1/20 0.43
SENP8 Q96LD8 1/20 0.43
SENP7 Q9BQF6 1/20 0.43
SENP6 Q9GZR1 1/20 0.43
THRB P10828 2/20 0.42
HRH3 Q9Y5N1 1/20 0.42
ESR1 P03372 2/20 0.41
ADRA2A P08913 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9851290 0.94 PPARA (0.48) MAPTRAB9AL3MBTL1HSD17B10ALDH1A1
SCHEMBL8365264 0.85 PPARA (0.44) HSD17B10ALDH1A1MEN1KMT2APPARA
SCHEMBL2772836 0.84 PPARG (0.43) MAPTALDH1A1KMT2APPARATHRB
SCHEMBL4059616 0.83 LMNA (0.46) MAPTPPARALMNACYP3A4PTGS2
SCHEMBL13845309 0.82 THRB (0.43) MAPTRAB9AL3MBTL1PPARATHRB
SCHEMBL10481201 0.80 HSD17B10 (0.50) MAPTRAB9AL3MBTL1RARBHSD17B10
SCHEMBL10481189 0.80 HSD17B10 (0.50) MAPTRAB9AL3MBTL1RARBHSD17B10
SCHEMBL9060970 0.80 PPARA (0.49) MAPTRAB9AL3MBTL1RARBHSD17B10
SCHEMBL9841237 0.79 HSD17B10 (0.49) MAPTRAB9AL3MBTL1RARBHSD17B10
SCHEMBL10481198 0.79 HSD17B10 (0.49) MAPTRAB9AL3MBTL1RARBHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed