⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15278108 | 0.89 | — | — | |
| SCHEMBL824269 | 0.85 | — | — | |
| SCHEMBL13753713 | 0.85 | — | — | |
| SCHEMBL13222981 | 0.84 | LNPEP (0.30) | — | |
| SCHEMBL13759960 | 0.82 | — | — | |
| SCHEMBL14313768 | 0.82 | — | — | |
| SCHEMBL13808834 | 0.81 | — | — | |
| SCHEMBL47427 | 0.81 | — | — | |
| SCHEMBL13360926 | 0.81 | — | — | |
| SCHEMBL18469165 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2060600-B1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2060600-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-20 | — | — | EP | disclosed |
| EP-1947510-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-07-23 | — | — | EP | disclosed |