Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.36 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.36 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.36 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.36 |
| ▸ | SHBG | P04278 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13855996 | 0.98 | PDK1 (0.33) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL13159748 | 0.80 | PDK1 (0.43) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL14230447 | 0.80 | PDK1 (0.43) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL19829294 | 0.78 | PDK1 (0.42) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL17835211 | 0.78 | SHBG (0.39) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL16864640 | 0.78 | SHBG (0.39) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL14230446 | 0.77 | PDK1 (0.40) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL14204533 | 0.77 | PDK1 (0.40) | PDK1PDK2PDK3PDK4SHBG | |
| SCHEMBL17835213 | 0.75 | SHBG (0.35) | SHBG | |
| SCHEMBL11101108 | 0.71 | SHBG (0.37) | PDK1PDK2PDK3PDK4SHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7537880-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-05-26 | — | — | US | disclosed |
| US-20080118860-A1 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-22 | — | — | US | disclosed |