SCHEMBL13878438

SCHEMBL13878438

CNc1ccc(Oc2ccc(NC(=O)c3ccc(Oc4ccc(C(C)=O)c(C(=O)O)c4)cc3C(=O)O)cc2)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 4/20 0.59
▸ MEN1 O00255 2/20 0.57
▸ KMT2A Q03164 2/20 0.57
▸ L3MBTL1 Q9Y468 2/20 0.57
▸ MAPK1 P28482 1/20 0.57
▸ GFER P55789 1/20 0.57
▸ LMNA P02545 2/20 0.56
▸ HPSE Q9Y251 1/20 0.51
▸ DUSP3 P51452 1/20 0.50
▸ PTPN5 P54829 1/20 0.50
▸ PTPN11 Q06124 1/20 0.50
▸ BRAF P15056 5/20 0.49
▸ HDAC1 Q13547 5/20 0.49
▸ HDAC3 O15379 2/20 0.49
▸ HDAC4 P56524 2/20 0.49
▸ HDAC7 Q8WUI4 2/20 0.49
▸ HDAC2 Q92769 2/20 0.49
▸ HDAC10 Q969S8 2/20 0.49
▸ HDAC11 Q96DB2 2/20 0.49
▸ HDAC8 Q9BY41 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12539660 0.89 MEN1 (0.53) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL13866797 0.85 MEN1 (0.52) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL13870130 0.85 MEN1 (0.52) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL15032718 0.84 TDP1 (0.49) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL18817567 0.84 MEN1 (0.49) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL675767 0.83 MEN1 (0.71) MEN1KMT2AL3MBTL1MAPK1GFER
SCHEMBL17445974 0.82 TDP1 (0.47) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL11940937 0.81 ALDH1A1 (0.61) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL15294833 0.81 MAPK1 (0.63) TDP1MEN1KMT2AL3MBTL1MAPK1
SCHEMBL11429681 0.80 TDP1 (0.64) TDP1MEN1KMT2AL3MBTL1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090111050-A1 Novel Photosensitive Resin Compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2009-04-30 — — US disclosed
US-20080305431-A1 PRETREATMENT COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2008-12-11 — — US disclosed
US-7407731-B2 of photosensitive polybenzoxazole (PBO) precursors, a mercapto compound of given formula such as 2-mercaptobenzoxazole to inhibit residue from forming, a photosensitive agent, a photoactive compound and solvent; electronics, relief images FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-05 — — US disclosed
US-7399572-B2 Pretreatment compositions FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-07-15 — — US disclosed
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