SCHEMBL13898764

SCHEMBL13898764

CCOC(C)Oc1ccc(C(C)CC)cc1C(C)=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.39
CYP3A4 P08684 1/20 0.39
ALDH1A1 P00352 4/20 0.38
PKM P14618 2/20 0.37
USP2 O75604 1/20 0.37
GAA P10253 1/20 0.37
HPGD P15428 1/20 0.37
ALOX15 P16050 1/20 0.37
HSD17B10 Q99714 1/20 0.37
ABCB1 P08183 1/20 0.36
HDAC4 P56524 1/20 0.35
HDAC2 Q92769 1/20 0.35
HDAC8 Q9BY41 1/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
HIF1A Q16665 1/20 0.35
LMNA P02545 2/20 0.34
TP53 P04637 1/20 0.34
MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10183520 0.87 HDAC4 (0.37) TSHRALDH1A1PKMUSP2GAA
SCHEMBL10138857 0.87 NPC1 (0.39) TSHRALDH1A1PKMUSP2GAA
SCHEMBL12054783 0.84 ALDH1A1 (0.38) TSHRALDH1A1PKMUSP2GAA
SCHEMBL10183538 0.82 ALDH1A1 (0.41) TSHRALDH1A1PKMUSP2GAA
SCHEMBL17515439 0.81 ALDH1A1 (0.47) TSHRCYP3A4ALDH1A1PKMUSP2
SCHEMBL25685903 0.80 TSHR (0.34) TSHRCYP3A4ALDH1A1ABCB1CA9
SCHEMBL17147977 0.80 ALDH1A1 (0.47) TSHRALDH1A1PKMUSP2GAA
SCHEMBL10148379 0.79 ALDH1A1 (0.38) TSHRALDH1A1PKMUSP2GAA
SCHEMBL2740735 0.79 ALDH1A1 (0.47) ALDH1A1PKMUSP2GAAHPGD
SCHEMBL13144265 0.76 ALDH1A1 (0.47) TSHRALDH1A1PKMUSP2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7498116-B2 Resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2009-03-03 US disclosed
US-20080241750-A1 RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed