SCHEMBL13899265

SCHEMBL13899265

CCC(CC(C)(CC(C)(C)C(=O)OC1CCOC1=O)C(=O)ON=C1CCCCC1)c1ccc(OC(C)=O)cc1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13899264 0.91 POLB (0.36) POLB
SCHEMBL13656529 0.67 POLB (0.35) POLB
SCHEMBL14750834 0.66 ALDH1A1 (0.43) POLB
SCHEMBL18308552 0.65 ALDH1A1 (0.42) POLB
SCHEMBL10186545 0.65 ALDH1A1 (0.42) POLB
SCHEMBL11986002 0.65 ALDH1A1 (0.42) POLB
SCHEMBL19679936 0.64 POLB (0.44) POLB
SCHEMBL12997169 0.64 ALDH1A1 (0.44) POLB
SCHEMBL47499 0.63 ALDH1A1 (0.48) POLB
SCHEMBL12326355 0.62 POLB (0.48) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7504195-B2 Photosensitive polymer and photoresist composition DONGJIN SEMICHEM CO., LTD. (KR) 2009-03-17 US disclosed
US-20080057436-A1 PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2008-03-06 US disclosed