SCHEMBL13908147

SCHEMBL13908147

c1ccc(OCCOC2(OCCOc3ccccc3)CCCCC2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNA3 P22001 1/20 0.48
HTR1A P08908 3/20 0.46
ADRA1D P25100 3/20 0.46
ADRA1B P35368 3/20 0.46
PKM P14618 2/20 0.44
DRD4 P21917 2/20 0.44
DRD2 P14416 1/20 0.44
DRD3 P35462 1/20 0.44
TAAR1 Q96RJ0 1/20 0.44
ALDH1A1 P00352 1/20 0.44
RECQL P46063 1/20 0.44
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
HRH3 Q9Y5N1 1/20 0.41
NPC1 O15118 1/20 0.41
HPGD P15428 1/20 0.41
RAB9A P51151 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
MAOB P27338 2/20 0.40
LTA4H P09960 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13908167 0.95 KCNA3 (0.44) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL13908165 0.95 KCNA3 (0.44) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL15150190 0.89 TAAR1 (0.42) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL13908163 0.82 DRD2 (0.47) DRD4DRD2DRD3MEN1KMT2A
SCHEMBL15142892 0.81 KCNA3 (0.44) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL13908166 0.78 DRD2 (0.44) DRD4DRD2DRD3ALDH1A1RECQL
SCHEMBL15135779 0.78 HRH3 (0.52) ALDH1A1MEN1KMT2AHRH3SMN1; SMN2
SCHEMBL9736396 0.76 PKM (0.49) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL15142894 0.75 KCNA3 (0.45) KCNA3HTR1AADRA1DADRA1BPKM
SCHEMBL27962 0.74 KCNA3 (0.82) KCNA3PKMDRD4DRD2DRD3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110546566-B Positive photosensitive siloxane composition and cured film formed using same 默克专利有限公司 2024-02-09 CN disclosed
CN-110709773-B Positive photosensitive siloxane composition and cured film formed using same 默克专利有限公司 2024-02-09 CN disclosed
US-11860537-B2 Positive type photosensitive siloxane composition and cured film formed by using the same MERCK PATENT GMBH (DE) 2024-01-02 US disclosed
US-11860537-B2 Positive type photosensitive siloxane composition and cured film formed by using the same MERCK PATENT GMBH (DE) 2024-01-02 US disclosed
US-11860537-B2 Positive type photosensitive siloxane composition and cured film formed by using the same MERCK PATENT GMBH (DE) 2024-01-02 US disclosed
US-11392032-B2 Positive type photosensitive siloxane composition and cured film formed by using the same MERCK PATENT GMBH (DE) 2022-07-19 US disclosed
US-20210116811-A1 POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME MERCK PATENT GMBH (DE) 2021-04-22 US disclosed
US-20210116811-A1 POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME MERCK PATENT GMBH (DE) 2021-04-22 US disclosed
US-20200073241-A1 POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME MERCK PATENT GMBH (DE) 2020-03-05 US disclosed
US-20200073241-A1 POSITIVE TYPE PHOTOSENSITIVE SILOXANE COMPOSITION AND CURED FILM FORMED BY USING THE SAME MERCK PATENT GMBH (DE) 2020-03-05 US disclosed
US-20080090175-A1 Positive working light sensitive planographic printing plate material and planographic printing plate manufacturing process employing the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2008-04-17 US disclosed
US-20080057438-A1 underlayer contains acid-decomposing compound and an acid generator; superior sensitivity, resistance against developer solution (resistance against film thickness loss), aging stability and decreased tint generation KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2008-03-06 US disclosed
US-20070287097-A1 Aluminum support containing multilayer alkali-soluble resin and a light to heat conversion material; sensitivity, chemical resistance KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-12-13 US disclosed
US-20070287097-A1 Aluminum support containing multilayer alkali-soluble resin and a light to heat conversion material; sensitivity, chemical resistance KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-12-13 US disclosed
US-20070172758-A1 Planographic printing plate material and its manufacturing process KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-07-26 US disclosed
US-20070172758-A1 Planographic printing plate material and its manufacturing process KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-07-26 US disclosed
US-7192691-B2 Method of manufacturing light sensitive planographic printing plates and method of using the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-03-20 US disclosed
US-7192691-B2 Method of manufacturing light sensitive planographic printing plates and method of using the same KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-03-20 US disclosed
US-20070059636-A1 Light sensitive planographic printing plate material KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-03-15 US disclosed
US-20070059636-A1 Light sensitive planographic printing plate material KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-03-15 US disclosed