Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.65 |
| ▸ | CA2 | P00918 | 3/20 | 0.65 |
| ▸ | CA7 | P43166 | 2/20 | 0.65 |
| ▸ | CA9 | Q16790 | 2/20 | 0.65 |
| ▸ | CA12 | O43570 | 1/20 | 0.65 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.65 |
| ▸ | ACHE | P22303 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.48 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.48 |
| ▸ | RECQL | P46063 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,4-Dimethoxybenzene SCHEMBL21802643 | 0.80 | CA1 (1.00) | CA1CA2CA7CA9CA12 | |
| 1,4-Dimethoxybenzene SCHEMBL8489 | 0.80 | CA1 (1.00) | CA1CA2CA7CA9CA12 | |
| SCHEMBL7167870 | 0.79 | CYP2A6 (0.60) | CA1CA2CA7CA9CA12 | |
| SCHEMBL351810 | 0.78 | CA1 (0.58) | CA1CA2CA7CA9CA12 | |
| SCHEMBL659460 | 0.77 | ACHE (0.52) | CA1CA2CA7CA9ACHE | |
| SCHEMBL1173553 | 0.74 | ACHE (0.50) | CA1CA2CA7CA9ACHE | |
| SCHEMBL21567722 | 0.74 | ACHE (0.54) | CA1CA2CA7CA9ACHE | |
| 1,4-Dimethoxybenzene SCHEMBL11373286 | 0.74 | CA1 (0.85) | CA1CA2CA7CA9CA12 | |
| SCHEMBL2178292 | 0.72 | CA2 (0.67) | CA1CA2CA7CA9CA12 | |
| SCHEMBL9151672 | 0.71 | CA1 (0.79) | CA1CA2CA7CA9CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-9255621-A | — | — | None | — | — | JP | disclosed |
| CN-117950268-A | Photoinitiation system for preparing holographic plastic with high photosensitivity and application thereof | 华中科技大学 | 2024-04-30 | — | — | CN | disclosed |
| CN-117777086-A | Antistatic auxiliary agent | 广荣化学株式会社 | 2024-03-29 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| WO-2023162552-A1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD FOR SUBSTRATE WITH TEMPLATE, AND PRODUCTION METHOD FOR PLATED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-6166006-A | Anilide derivative, production and use thereof | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| EP-1039899-A2 | PHARMACEUTICAL COMPOSITION FOR ANTAGONIZING CCR5 COMPRISING ANILIDE DERIVATIVE | Takeda Chemical Industries, Ltd. (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1040103-A1 | ANILIDE DERIVATIVE, PRODUCTION AND USE THEREOF | Takeda Chemical Industries, Ltd. (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1022324-A2 | Liquid crystal composite material and liquid crystal display device(s) which use them | SEIKO EPSON CORPORATION (JP) | 2000-07-26 | — | — | EP | disclosed |
| US-5972240-A | LIQUID CRYSTAL COMPOSITE MATERIALS CONTAINING ORGANIC COMPOUNDS ENABLE THE LOWERING OF THE DRIVE VOLTAGE OF LIQUID CRYSTAL DISPLAY DEVICES AND OF LIQUID CRYSTAL DISPLAY DEVICES OF A POLYMER-DISPERSION TYPE | SEIKO EPSON CORPORATION (JP) | 1999-10-26 | — | — | US | disclosed |
| WO-1999032100-A2 | PHARMACEUTICAL COMPOSITION FOR ANTAGONIZING CCR5 COMPRISING ANILIDE DERIVATIVE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1999-07-01 | — | — | WO | disclosed |
| WO-1999032468-A1 | ANILIDE DERIVATIVE, PRODUCTION AND USE THEREOF | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1999-07-01 | — | — | WO | disclosed |
| JP-H09255621-A | TERPHENYL ACRYLATE COMPOUND AND POLYMER DISPERSION TYPE LIQUID CRYSTAL DISPLAY ELEMENT USING THE SAME | SEIKO EPSON CORP | 1997-09-30 | — | — | JP | disclosed |
| EP-0730019-A1 | LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY ELEMENT PRODUCED THEREFROM | SEIKO EPSON CORPORATION (JP) | 1996-09-04 | — | — | EP | disclosed |
| EP-0031537-A1 | Process for preparing oxiranes | BAYER AG (DE) | 1981-07-08 | — | — | EP | disclosed |