⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2036581 | 0.87 | CHRM1 (0.43) | — | |
| SCHEMBL29810701 | 0.82 | CYP1A2 (0.38) | — | |
| SCHEMBL5791513 | 0.81 | CA2 (0.56) | — | |
| SCHEMBL3018124 | 0.81 | CA2 (0.36) | — | |
| SCHEMBL141328 | 0.81 | HDAC1 (0.65) | — | |
| SCHEMBL1520913 | 0.80 | — | — | |
| SCHEMBL28210977 | 0.80 | — | — | |
| SCHEMBL15362652 | 0.80 | — | — | |
| SCHEMBL15016034 | 0.80 | — | — | |
| SCHEMBL6468088 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 752 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| EP-3483193-B1 | CURABLE COMPOSITION, METHOD FOR PRODUCING SAME, AND ARTICLE PRODUCED THEREWITH | DAIKIN IND LTD (JP) | 2023-08-23 | — | — | EP | claimed |
| EP-3497520-B1 | BOTTOM ANTIREFLECTIVE COATING FORMING COMPOSITION | MERCK PATENT GMBH (DE) | 2020-10-21 | — | — | EP | claimed |
| US-9952510-B2 | Thinner composition | DONGWOO FINE-CHEM CO., LTD. (KR) | 2018-04-24 | — | — | US | claimed |
| US-20160230129-A1 | THINNER COMPOSITION | DONGWOO FINE-CHEM CO., LTD. (KR) | 2016-08-11 | — | — | US | claimed |
| US-8822127-B2 | Photosensitive resin composition for black matrix | LG CHEM, LTD. (KR) | 2014-09-02 | — | — | US | claimed |
| EP-1798596-B1 | Positive photoresist composition | SHINETSU CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | claimed |
| EP-1637928-B1 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2012-05-02 | — | — | EP | claimed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| US-20070060729-A1 | Photosensitive resin composition and dry film resist using the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2007-03-15 | — | — | US | claimed |
| EP-1637928-A2 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD (KR) | 2006-03-22 | — | — | EP | claimed |
| US-20060057494-A1 | Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same | DONGJIN SEMICHEM CO., LTD. | 2006-03-16 | — | — | US | claimed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | claimed |
| EP-1271244-B1 | Method for fabricating an organic thin film | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2004-08-25 | — | — | EP | claimed |
| EP-0907108-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-01-28 | — | — | EP | claimed |
| EP-0948553-B1 | FRACTIONATED NOVOLAK RESIN FROM CRESOL-FORMALDEHYDE REACTION MIXTURE AND PHOTORESIST COMPOSITION THEREFROM | CLARIANT FINANCE BVI LTD (VG) | 2001-04-11 | — | — | EP | claimed |
| US-4814492-A | Method of preparing alkyl acrylates | TEXACO INC. (US) | 1989-03-21 | — | — | US | claimed |