Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC1 | Q13547 | 2/20 | 0.65 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.65 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.65 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.65 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.65 |
| ▸ | HTR2A | P28223 | 1/20 | 0.65 |
| ▸ | HTR2C | P28335 | 1/20 | 0.65 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.65 |
| ▸ | HRH1 | P35367 | 1/20 | 0.65 |
| ▸ | DRD3 | P35462 | 1/20 | 0.65 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.65 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.65 |
| ▸ | SLC1A1 | P43005 | 4/20 | 0.50 |
| ▸ | SLC1A2 | P43004 | 3/20 | 0.50 |
| ▸ | GRIK1 | P39086 | 3/20 | 0.50 |
| ▸ | GRIK2 | Q13002 | 3/20 | 0.50 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1930750 | 0.87 | CA2 (0.63) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL5514967 | 0.84 | HDAC1 (0.70) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL2036581 | 0.83 | CHRM1 (0.43) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL3285540 | 0.83 | TDP1 (0.60) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL28210380 | 0.82 | HDAC1 (0.46) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL139440 | 0.81 | — | — | |
| SCHEMBL4579756 | 0.81 | CHRM1 (0.64) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL2245789 | 0.80 | CHRM1 (0.62) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| SCHEMBL28244713 | 0.80 | CA1 (0.53) | HDAC1HDAC2CHRM1AKR1A1CHRM3 | |
| Valproic Acid SCHEMBL2275 | 0.80 | CHRM1 (1.00) | HDAC1HDAC2CHRM1AKR1A1CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 709 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| EP-0907108-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-01-28 | — | — | EP | claimed |
| EP-4745668-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-20 | — | — | EP | disclosed |
| US-12631962-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12625428-B2 | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-12 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4722811-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-6368195-B1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2002-04-09 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6126513-A | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-03 | — | — | US | disclosed |
| US-6071673-A | Method for the formation of resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-06 | — | — | US | disclosed |
| EP-0890417-A1 | Plastic abrasive for sandblasting, method for sandblast processing plasma display panel substrate using the same and method for treating sandblasting waste matters | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-13 | — | — | EP | disclosed |
| US-5225590-A | Alkoxy methyl ether and alkoxy methyl ester derivatives | SYNTEX (U.S.A.) INC. (US) | 1993-07-06 | — | — | US | disclosed |
| EP-0187297-B1 | ALKOXY METHYL ETHER AND ALKOXY METHYL ESTER DERIVATIVES | SYNTEX (U.S.A.) INC. (US) | 1991-08-21 | — | — | EP | disclosed |
| EP-0187297-A2 | Alkoxy methyl ether and alkoxy methyl ester derivatives | SYNTEX (U.S.A.) INC. (US) | 1986-07-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12631962-B2 | Resist composition and method for forming resist pattern | TERB1, TERF2, LSM8 | HDAC1 3441/4885HDAC2 3875/4885CHRM1 3745/4885 |
| US-12625428-B2 | Stepped substrate coating composition including compound having photocrosslinking group due to unsaturated bond between carbon atoms | SEM1, CDH1, EEF1D | HDAC1 1132/4885HDAC2 1486/4885CHRM1 774/4885 |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | HDAC1 889/4885HDAC2 2174/4885CHRM1 1698/4885 |
| US-12631963-B2 | Method for producing hollow package and method for providing photosensitive composition | ASH2L, AS3MT, ASH1L | HDAC1 2019/4885HDAC2 2828/4885CHRM1 713/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | HDAC1 2241/4885HDAC2 2755/4885CHRM1 1106/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.