Adipic Acid

Adipic Acid

SCHEMBL1396016

C=C.C=C.O=C(O)CCCCC(=O)O

nearest known ligand 0.85

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

SLC18A2SLC6A2SLC6A3

The experimentally established mechanism targets of Adipic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.85
TSHR P16473 5/20 0.79
NFKB1 P19838 2/20 0.79
PMP22 Q01453 1/20 0.79
SLC22A6 Q4U2R8 2/20 0.71
GPR84 Q9NQS5 5/20 0.61
FFAR1 O14842 2/20 0.61
FFAR4 Q5NUL3 2/20 0.61
AKR1B1 P15121 1/20 0.61
CYP2D6 P10635 1/20 0.61
FOLH1 Q04609 1/20 0.61
CAMK2A Q9UQM7 1/20 0.59
PPARG P37231 6/20 0.58
PPARD Q03181 6/20 0.58
PPARA Q07869 6/20 0.58
HDAC11 Q96DB2 5/20 0.58
ALDH1A1 P00352 2/20 0.58
TLR2 O60603 2/20 0.58
TDP1 Q9NUW8 2/20 0.58
FABP4 P15090 2/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Adipic Acid SCHEMBL27694366 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL28728956 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL29073759 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL1162729 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL7521011 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL11871477 1.00 LMNA (0.85) LMNATSHRNFKB1PMP22SLC22A6
Adipic Acid SCHEMBL23930409 0.96 LMNA (0.79) LMNATSHRNFKB1PMP22SLC22A6
Sebacic Acid SCHEMBL7056501 0.96 TSHR (0.86) LMNATSHRNFKB1PMP22SLC22A6
Sebacic Acid SCHEMBL7053993 0.96 TSHR (0.86) LMNATSHRNFKB1PMP22SLC22A6
Sebacic Acid SCHEMBL7053731 0.96 TSHR (0.86) LMNATSHRNFKB1PMP22SLC22A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2619 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12509545-B2 Anhydride catalysts for urethane and urethane-urea systems URETHANE SYSTEMS USA LLC (US) 2025-12-30 US claimed
CN-118272031-B Adhesive for improving compressive strength of ultrathin stone 山东华诚高科胶粘剂有限公司 2024-09-06 CN claimed
CN-118272031-A Adhesive for improving compressive strength of ultrathin stone 山东华诚高科胶粘剂有限公司 2024-07-02 CN claimed
CN-115403916-A Piezoelectric power generation device shell material for chip in shoe and preparation method thereof 上海年与轻科技(集团)有限公司 2022-11-29 CN claimed
CN-115322725-A Epoxy resin modified single-component moisture-cured polyurethane adhesive and preparation method thereof 哈尔滨工业大学无锡新材料研究院 2022-11-11 CN claimed
US-11466142-B2 Cellulose based composition WOODLY OY (FI) 2022-10-11 US claimed
CN-115141591-A Epoxy resin modified single-component polyurethane structural adhesive and preparation method thereof 哈尔滨工业大学无锡新材料研究院 2022-10-04 CN claimed
CN-114774066-A Fast-positioning low-shrinkage UV (ultraviolet) moisture dual-curing polyurethane hot melt adhesive and preparation method thereof 烟台信友新材料有限公司 2022-07-22 CN claimed
CN-112552859-B High-initial-adhesion low-shrinkage high-strength polyurethane hot melt adhesive and preparation method thereof 烟台信友新材料有限公司 2022-07-15 CN claimed
CN-110818873-B Waterborne polyurethane resin and preparation method and application thereof 万华化学集团股份有限公司 2022-07-12 CN claimed
US-5126228-A Presensitized FUJI PHOTO FILM, CO., LTD. (JP) 1992-06-30 US claimed
US-5024893-A With heat resistant layer of polyurethane containing pendant siloxane and polyol groups; antisticking, antiblocking, flexibility DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) 1991-06-18 US claimed
CN-1050620-A In photopolymer, form the holographic optical elements (HOE) of reflection hologram DU PONT (US) 1991-04-10 CN claimed
CN-1011318-B ELECTROPLATE SOLUTION COMPOSED OF BRIGHT SN-ZN ALLOY TIANJIN COMMUNICATION BROADCAS (CN) 1991-01-23 CN claimed
CN-1048458-A Be used to look squarely the improvement holographic optics combiner of demonstration DU PONT (US) 1991-01-09 CN claimed
EP-0386777-A2 PS plate for use in making lithographic printing plate requiring no dampening water Fuji Photo Film Co., Ltd. (JP) 1990-09-12 EP claimed
US-4942212-A POLYSILOXANEPOLYOLS, POLYISOCYANATES, CHAIN EXTENDERS, FLEXIBILITY DAINICHISEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) 1990-07-17 US claimed
CN-1036083-A In photopolymerizable layer, form the method for reflection hologram DU PONT (US) 1989-10-04 CN claimed
US-4510186-A HYDROPHODBIC AND HYDROPHILIC POLYURETHANES, SOLVENT, WATER; DRYING DAINICHI SEIKA COLOR & CHEMICALS MFG. CO., LTD. (JP) 1985-04-09 US claimed
US-4071279-A Solid polyurethane tire and wheel assembly THE GOODYEAR TIRE & RUBBER COMPANY (US) 1978-01-31 US claimed