SCHEMBL13970949

SCHEMBL13970949

CCC1C2CCC(O)C1OC2=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25468237 0.70 HMGCR (0.37) —
SCHEMBL15147137 0.64 CYP2D6 (0.30) —
SCHEMBL10409670 0.63 — —
SCHEMBL5526512 0.62 CYP2D6 (0.32) —
SCHEMBL14489073 0.62 PRKCA (0.31) —
SCHEMBL24925766 0.59 — —
SCHEMBL10282834 0.59 LMNA (0.45) —
SCHEMBL3553194 0.59 — —
SCHEMBL2243896 0.59 — —
SCHEMBL34400 0.59 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2019334-A2 Positive resist composition and method of pattern formation with the same Fujifilm Corporation (JP) 2009-01-28 — — EP disclosed
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