Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
| ▸ | CTSL | P07711 | 1/20 | 0.31 |
| ▸ | CTSB | P07858 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5154743 | 1.00 | TSHR (0.38) | TSHRHPGDTHRBCTSLCTSB | |
| SCHEMBL2938659 | 0.98 | TSHR (0.39) | TSHRHPGDTHRB | |
| SCHEMBL48742 | 0.91 | TSHR (0.41) | TSHRHPGDTHRB | |
| SCHEMBL1648754 | 0.90 | TSHR (0.43) | TSHRHPGDTHRBCTSLCTSB | |
| SCHEMBL29117687 | 0.90 | TSHR (0.43) | TSHRHPGDTHRBCTSLCTSB | |
| SCHEMBL22772606 | 0.89 | TSHR (0.33) | TSHRHPGD | |
| SCHEMBL22772601 | 0.89 | TSHR (0.33) | TSHRHPGD | |
| SCHEMBL21333042 | 0.89 | TSHR (0.33) | TSHRHPGD | |
| SCHEMBL4401693 | 0.88 | TSHR (0.44) | TSHRHPGDTHRBCTSLCTSB | |
| SCHEMBL22772602 | 0.87 | TSHR (0.34) | TSHRHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109879756-A | The preparation method of 1- isopropylcyclohexyl (methyl) acrylate | 江苏南大光电材料股份有限公司 | 2019-06-14 | — | — | CN | claimed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2018-01-11 | — | — | US | disclosed |
| WO-2016124493-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2016-08-11 | — | — | WO | disclosed |
| US-9005871-B2 | Sulfonium derivatives and the use therof as latent acids | BASF SE (DE) | 2015-04-14 | — | — | US | disclosed |
| US-8580478-B2 | Latent acids and their use | BASF SE (DE) | 2013-11-12 | — | — | US | disclosed |
| EP-2539316-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2013-01-02 | — | — | EP | disclosed |
| EP-2349993-B1 | SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS | BASF SE (DE) | 2012-12-12 | — | — | EP | disclosed |
| EP-2030081-A2 | OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS | Ciba Holding Inc. (CH) | 2009-03-04 | — | — | EP | disclosed |
| US-7452655-B2 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-11-18 | — | — | US | disclosed |
| US-20080193874-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |
| WO-2007147782-A2 | OXIME SULFONATES AND THE USE THEROF AS LATENT ACIDS | CIBA HOLDING INC. (CH) | 2007-12-27 | — | — | WO | disclosed |
| US-7205090-B2 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-17 | — | — | US | disclosed |
| US-20060074139-A1 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-04-06 | — | — | US | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-6517993-B2 | Radiation transparent; sensitivity | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-20020031719-A1 | Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | TOKYO OHKA KOGYO CO., LTD. | 2002-03-14 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180009775-A1 | LATENT ACIDS AND THEIR USE | LTA, C1S, C9 | TSHR 3529/4885HPGD 945/4885THRB 2254/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.