SCHEMBL13992817

SCHEMBL13992817

CC(C)(C)C1CC2(CO)CCC1O2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13992837 0.69 AKR1B10 (0.32) —
SCHEMBL6369425 0.63 LMNA (0.32) —
SCHEMBL13891009 0.62 KDM4E (0.32) —
SCHEMBL14335496 0.61 — —
SCHEMBL9792848 0.58 — —
SCHEMBL13455567 0.56 — —
SCHEMBL13877815 0.54 KDM4E (0.36) —
SCHEMBL15106203 0.54 ESR2 (0.37) —
SCHEMBL5946583 0.54 LIPA (0.36) —
SCHEMBL13877814 0.54 KDM4E (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7459261-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-12-02 — — US disclosed
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