⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5961072 | 0.83 | LMNA (0.38) | — | |
| SCHEMBL4963064 | 0.78 | ALDH1A1 (0.42) | — | |
| SCHEMBL5961045 | 0.76 | ALDH1A1 (0.41) | — | |
| SCHEMBL285827 | 0.76 | ALDH1A1 (0.41) | — | |
| SCHEMBL7952265 | 0.76 | — | — | |
| SCHEMBL46516 | 0.75 | — | — | |
| SCHEMBL3269649 | 0.75 | ALDH1A1 (0.43) | — | |
| SCHEMBL10544547 | 0.75 | ALDH1A1 (0.43) | — | |
| SCHEMBL19601453 | 0.75 | ALDH1A1 (0.43) | — | |
| SCHEMBL17169736 | 0.75 | ALDH1A1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2123695-B1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-2314637-B1 | COMPOSITION, POLYMERIZABLE COMPOSITION, RESIN, OPTICAL COMPONENT, AND PRODUCTION METHOD OF COMPOSITION | MITSUI CHEMICALS INC (JP) | 2017-07-12 | — | — | EP | disclosed |
| EP-2230271-B1 | ADDITIVE FOR POLYMERIZABLE COMPOSITION, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, AND USE OF THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS INC (JP) | 2016-09-07 | — | — | EP | disclosed |
| EP-2982706-A1 | ADDITIVE FOR POLYMERIZABLE COMPOSITION, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, AND USE OF THE POLYMERIZABLE COMPOSITION | Mitsui Chemicals, Inc. (JP) | 2016-02-10 | — | — | EP | disclosed |
| EP-2292597-B1 | METAL COMPOUND, POLYMERIZABLE COMPOSITION CONTAINING THE SAME, RESIN, METHOD FOR PRODUCING THE RESIN AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2015-03-04 | — | — | EP | disclosed |
| US-8697889-B2 | Metal compound, polymerizable composition containing the same, resin, method for producing the resin, and use of the resin | MITSUI CHEMICALS, INC. (JP) | 2014-04-15 | — | — | US | disclosed |
| EP-1813639-B1 | METAL-CONTAINING COMPOUND AND USE THEREOF | MITSUI CHEMICALS INC (JP) | 2014-03-12 | — | — | EP | disclosed |
| US-8637633-B2 | Polymerizable composition, and resin and optical part using the same | MITSUI CHEMICALS, INC. (JP) | 2014-01-28 | — | — | US | disclosed |
| EP-2311845-B1 | COMPOUND, POLYMERIZABLE COMPOSITION, RESIN, AND USE OF THE COMPOSITION AND THE RESIN | MITSUI CHEMICALS INC (JP) | 2013-09-25 | — | — | EP | disclosed |
| EP-2006319-B1 | POLYMERIZABLE COMPOSITION, RESIN USING SAME, OPTICAL COMPONENT AND LENS | MITSUI CHEMICALS INC (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-6174887-B1 | Amide compounds and use of the same | JAPAN TOBACCO INC. (JP) | 2001-01-16 | — | — | US | disclosed |
| US-6106999-A | SENSITIVITY TO GENERAL-PURPOSE VISIBLE LIGHT LASER, SO THAT HIGH-SPEED SCANNING EXPOSURE IS POSSIBLE BY LASER, AND EXTREMELY FINE HIGH RESOLUTION CAN BE OBTAINED; CAN BE USED FOR COATING OR PRINTING UNDER SAFELIGHT IRRADIATING CONDITIONS | MITSUI CHEMICALS (JP) | 2000-08-22 | — | — | US | disclosed |
| EP-0637298-B1 | SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM | BASF AG (DE) | 1999-03-31 | — | — | EP | disclosed |
| US-5817603-A | HERBICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1998-10-06 | — | — | US | disclosed |
| EP-0849256-A1 | AMIDE COMPOUNDS AND USE OF THE SAME | Japan Tobacco Inc. (JP) | 1998-06-24 | — | — | EP | disclosed |
| US-5602074-A | HERBICIDES; PLANT DESICCATION, DEFOLIATION | BASF AKTIENGESELLSCHAFT (DE) | 1997-02-11 | — | — | US | disclosed |
| EP-0641321-A1 | SUBSTITUTED ISOINDOLONES | BASF Aktiengesellschaft (DE) | 1995-03-08 | — | — | EP | disclosed |
| EP-0637298-A1 | SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM | BASF Aktiengesellschaft (DE) | 1995-02-08 | — | — | EP | disclosed |
| WO-1993024456-A1 | SUBSTITUTED ISOINDOLONES | BASF AKTIENGESELLSCHAFT (DE) | 1993-12-09 | — | — | WO | disclosed |
| WO-1993022280-A1 | SUBSTITUTED CYCLOHEXENE-1,2-BICARBOXYLIC ACID DERIVATIVES AND RAW MATERIALS FOR PRODUCING THEM | BASF AKTIENGESELLSCHAFT (DE) | 1993-11-11 | — | — | WO | disclosed |