Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1402767 | 0.80 | — | — | |
| SCHEMBL21409487 | 0.80 | — | — | |
| SCHEMBL1402624 | 0.80 | — | — | |
| SCHEMBL21409505 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL2733967 | 0.71 | — | — | |
| SCHEMBL21409496 | 0.69 | ALDH1A1 (0.39) | — | |
| SCHEMBL1402458 | 0.68 | TSHR (0.31) | — | |
| SCHEMBL22129866 | 0.68 | TSHR (0.31) | — | |
| SCHEMBL21409489 | 0.68 | — | — | |
| SCHEMBL40032 | 0.67 | ALDH1A1 (0.47) | TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2963457-B1 | OPTICAL MATERIAL, COMPOSITION FOR USE THEREIN, AND USE THEREOF | MITSUI CHEMICALS INC (JP) | 2018-07-11 | — | — | EP | claimed |
| US-20220056170-A1 | OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL | TOKUYAMA CORPORATION (JP) | 2022-02-24 | — | — | US | disclosed |
| US-20210372984-A1 | METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2021-12-02 | — | — | US | disclosed |
| EP-3901184-A1 | OPTICAL MATERIAL COMPOSITION AND OPTICAL MATERIAL | Tokuyama Corporation (JP) | 2021-10-27 | — | — | EP | disclosed |
| EP-2123695-B1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-3828224-A1 | METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2021-06-02 | — | — | EP | disclosed |
| US-20210079151-A1 | METHOD FOR SETTING POLYMERIZATION CONDITION AND METHOD FOR MANUFACTURING OPTICAL MATERIAL | MITSUI CHEMICALS, INC. (JP) | 2021-03-18 | — | — | US | disclosed |
| EP-3778655-A1 | METHOD FOR SETTING POLYMERIZATION CONDITIONS AND METHOD FOR PRODUCING OPTICAL MATERIAL | Mitsui Chemicals, Inc. (JP) | 2021-02-17 | — | — | EP | disclosed |
| US-20210041599-A1 | PLASTIC POLARIZING LENS AND METHOD FOR MANUFACTURING SAME | HOPNIC LABORATORY CO., LTD. (JP) | 2021-02-11 | — | — | US | disclosed |
| US-10899094-B2 | Method of manufacturing plastic lens, method of positioning film, and composite body | HOPNIC LABORATORY CO., LTD. (JP) | 2021-01-26 | — | — | US | disclosed |
| EP-1482002-B1 | POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS INC (JP) | 2010-04-28 | — | — | EP | disclosed |
| US-20100063246-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS | MITSUI CHEMICALS, INC. (JP) | 2010-03-11 | — | — | US | disclosed |
| EP-2123695-A1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | Mitsui Chemicals, Inc. (JP) | 2009-11-25 | — | — | EP | disclosed |
| EP-2036951-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS | Mitsui Chemicals, Inc. (JP) | 2009-03-18 | — | — | EP | disclosed |
| EP-2014700-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT | Mitsui Chemicals, Inc. (JP) | 2009-01-14 | — | — | EP | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| US-7132501-B2 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2006-11-07 | — | — | US | disclosed |
| US-20050215757-A1 | Polymerizable composition containing novel cyclic sulfur compound and resin obtained by curing the polymerizable composition | MITSUI CHEMICALS, INC. (JP) | 2005-09-29 | — | — | US | disclosed |
| EP-1482002-A1 | POLYMERIZABLE COMPOSITION CONTAINING NOVEL CYCLIC SULFUR COMPOUND AND RESIN OBTAINED BY CURING THE POLYMERIZABLE COMPOSITION | MITSUI CHEMICALS, INC. (JP) | 2004-12-01 | — | — | EP | disclosed |