SCHEMBL14029044

SCHEMBL14029044

c1cc(C2=NCCCN2)cc(C2=NCCCN2)c1

nearest known ligand 0.75

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
▸ NISCH Q9Y2I1 12/20 0.75
▸ GAA P10253 1/20 0.75
▸ TSHR P16473 1/20 0.75
▸ MAOB P27338 1/20 0.57
▸ TOP2A P11388 3/20 0.56
▸ TOP2B Q02880 3/20 0.56
▸ ACHE P22303 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7015982 0.88 NISCH (0.64) NISCHGAATSHRMAOBTOP2A
SCHEMBL14981459 0.88 NISCH (0.81) NISCHGAATSHRMAOBTOP2A
SCHEMBL9189709 0.88 NISCH (0.85) NISCHGAATSHRMAOBACHE
SCHEMBL6365864 0.86 NISCH (1.00) NISCHGAATSHRMAOBTOP2A
SCHEMBL16202645 0.84 NISCH (0.58) NISCHGAATSHRMAOBTOP2A
SCHEMBL21672908 0.84 NISCH (0.60) NISCHGAATSHRMAOBTOP2A
SCHEMBL13327264 0.83 NISCH (0.81) NISCHGAATSHRTOP2ATOP2B
SCHEMBL3858563 0.81 NISCH (0.55) NISCHGAATSHRMAOB
SCHEMBL24495491 0.81 NISCH (1.00) NISCHGAATSHRMAOBACHE
SCHEMBL5141529 0.79 NISCH (0.80) NISCHGAATSHRTOP2ATOP2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439011-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2008-10-21 — — US disclosed
US-7419774-B2 Photothermographic material and method for processing the same FUJILFILM CORPORATION (JP) 2008-09-02 — — US disclosed
US-7223528-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-05-29 — — US disclosed
US-7223528-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-05-29 — — US disclosed
US-20070003887-A1 Photothermographic material RIKIO INOUE 2007-01-04 — — US disclosed
US-20070003887-A1 Photothermographic material RIKIO INOUE 2007-01-04 — — US disclosed
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