SCHEMBL14030833

SCHEMBL14030833

Nc1cc2nc(-c3cccc(C(=O)O)c3)oc2cc1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HDAC6 Q9UBN7 3/20 0.48
▸ MAPT P10636 5/20 0.48
▸ SNCA P37840 1/20 0.48
▸ TTR P02766 1/20 0.47
▸ ALB P02768 1/20 0.47
▸ MAOA P21397 1/20 0.47
▸ CNR1 P21554 1/20 0.47
▸ DRD1 P21728 1/20 0.47
▸ OPRD1 P41143 1/20 0.47
▸ PDE4D Q08499 1/20 0.47
▸ PDE3A Q14432 1/20 0.47
▸ HSPD1 P10809 1/20 0.45
▸ HSPE1 P61604 1/20 0.45
▸ HPSE Q9Y251 6/20 0.44
▸ RAB9A P51151 5/20 0.44
▸ KMT2A Q03164 3/20 0.44
▸ MEN1 O00255 2/20 0.44
▸ NPC1 O15118 4/20 0.43
▸ L3MBTL1 Q9Y468 1/20 0.43
▸ KDM4E B2RXH2 4/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14030790 0.86 MAPT (0.50) HDAC6MAPTSNCATTRALB
SCHEMBL14030796 0.86 TTR (0.49) MAPTSNCATTRALBMAOA
SCHEMBL14030815 0.86 HPSE (0.53) HDAC6MAPTHSPD1HSPE1HPSE
SCHEMBL4307744 0.86 MAPT (0.51) HDAC6MAPTSNCATTRALB
Ammonia Solution, Strong SCHEMBL17024437 0.85 MAPT (0.50) HDAC6MAPTSNCATTRALB
SCHEMBL1675525 0.81 HDAC6 (0.63) HDAC6MAPTTTRALBMAOA
SCHEMBL1675377 0.81 TTR (0.68) HDAC6MAPTTTRALBMAOA
SCHEMBL14030787 0.81 MAPT (0.51) HDAC6MAPTSNCATTRALB
SCHEMBL29488241 0.80 TTR (0.43) HDAC6MAPTSNCATTRALB
SCHEMBL28396365 0.80 TTR (0.43) HDAC6MAPTSNCATTRALB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080269455-A1 Process for Production of Polybenzazole Polymer and the Polymer TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-30 — — US disclosed
US-20080269455-A1 Process for Production of Polybenzazole Polymer and the Polymer TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-30 — — US disclosed
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