SCHEMBL14030790

SCHEMBL14030790

Nc1cc2nc(-c3ccc4cc(C(=O)O)ccc4c3)oc2cc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 4/20 0.50
▸ SNCA P37840 1/20 0.50
▸ TTR P02766 1/20 0.49
▸ ALB P02768 1/20 0.49
▸ MAOA P21397 1/20 0.49
▸ CNR1 P21554 1/20 0.49
▸ DRD1 P21728 1/20 0.49
▸ OPRD1 P41143 1/20 0.49
▸ PDE4D Q08499 1/20 0.49
▸ PDE3A Q14432 1/20 0.49
▸ ESR1 P03372 7/20 0.48
▸ ESR2 Q92731 7/20 0.48
▸ TP53 P04637 3/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.43
▸ RARB P10826 1/20 0.42
▸ RARG P13631 1/20 0.42
▸ HDAC6 Q9UBN7 2/20 0.42
▸ HPSE Q9Y251 2/20 0.41
▸ UTRN P46939 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4307744 0.90 MAPT (0.51) MAPTSNCATTRALBMAOA
Ammonia Solution, Strong SCHEMBL17024437 0.89 MAPT (0.50) MAPTSNCATTRALBMAOA
SCHEMBL14030833 0.86 HDAC6 (0.48) MAPTSNCATTRALBMAOA
SCHEMBL14030787 0.85 MAPT (0.51) MAPTSNCATTRALBMAOA
SCHEMBL14030845 0.83 MAPT (0.50) MAPTSNCATTRALBMAOA
SCHEMBL14030842 0.80 MAPT (0.46) MAPTTTRALBMAOACNR1
SCHEMBL29488241 0.79 TTR (0.43) MAPTSNCATTRALBMAOA
SCHEMBL28396365 0.79 TTR (0.43) MAPTSNCATTRALBMAOA
SCHEMBL15723573 0.79 MAPT (0.55) MAPTSNCAESR1ESR2TP53
SCHEMBL13347357 0.79 MAPT (0.59) MAPTSNCAESR1ESR2TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080269455-A1 Process for Production of Polybenzazole Polymer and the Polymer TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-30 — — US disclosed
US-20080269455-A1 Process for Production of Polybenzazole Polymer and the Polymer TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-30 — — US disclosed
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