SCHEMBL14035792

SCHEMBL14035792

O=C(Oc1ccc(-c2ccccc2)cc1)C(F)(F)OOS

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.41
MEN1 O00255 3/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
LMNA P02545 2/20 0.41
NPSR1 Q6W5P4 1/20 0.41
KIF11 P52732 1/20 0.41
HDAC1 Q13547 7/20 0.40
HDAC2 Q92769 7/20 0.40
HDAC3 O15379 4/20 0.40
HDAC4 P56524 4/20 0.40
HDAC7 Q8WUI4 4/20 0.40
HDAC10 Q969S8 4/20 0.40
HDAC11 Q96DB2 4/20 0.40
HDAC8 Q9BY41 4/20 0.40
HDAC6 Q9UBN7 4/20 0.40
HDAC9 Q9UKV0 4/20 0.40
HDAC5 Q9UQL6 4/20 0.40
ELANE P08246 2/20 0.40
FABP7 O15540 1/20 0.39
FABP3 P05413 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035683 0.90 ELANE (0.40) HDAC1HDAC2ELANEKDM4ETDP1
SCHEMBL14035685 0.80 KMT2A (0.47) KMT2AMEN1SMN1; SMN2FABP7FABP3
SCHEMBL9543659 0.80 HDAC1 (0.50) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL12128723 0.77 ELANE (0.51) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL2605893 0.73 PTPN1 (0.46) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL9541895 0.73 KMT2A (0.49) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL16005531 0.73 ELANE (0.69) LMNAELANENPC1GAACYP1A2
SCHEMBL14827313 0.72 ELANE (0.46) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL14009434 0.72 HDAC1 (0.43) KMT2AMEN1SMN1; SMN2LMNANPSR1
SCHEMBL6721075 0.71 ELANE (0.53) KMT2AMEN1SMN1; SMN2LMNANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed