SCHEMBL14035685

SCHEMBL14035685

O=C(Oc1ccc2ccccc2c1)C(F)(F)OOS

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.47
MEN1 O00255 5/20 0.47
MAPT P10636 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
ALDH1A1 P00352 3/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
HSD17B10 Q99714 1/20 0.43
ESR1 P03372 3/20 0.42
ESR2 Q92731 2/20 0.42
PTPN7 P35236 1/20 0.41
MMP1 P03956 2/20 0.40
MMP12 P39900 1/20 0.40
KDM4E B2RXH2 1/20 0.40
FABP7 O15540 1/20 0.40
FABP3 P05413 1/20 0.40
BCHE P06276 1/20 0.40
FAAH O00519 1/20 0.40
EPHX1 P07099 1/20 0.40
MMP2 P08253 1/20 0.40
NPC1 O15118 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14035683 0.82 ELANE (0.40) MAPTTDP1ALDH1A1L3MBTL1HSD17B10
SCHEMBL14035923 0.81 PPARG (0.48) KMT2AMEN1MAPTTDP1ALDH1A1
SCHEMBL1896897 0.80 KMT2A (0.56) KMT2AMEN1MAPTTDP1ALDH1A1
SCHEMBL14035792 0.80 KMT2A (0.41) KMT2AMEN1MAPTTDP1KDM4E
SCHEMBL12128694 0.78 KMT2A (0.53) KMT2AMEN1MAPTTDP1ALDH1A1
SCHEMBL14035690 0.77 SLC1A3 (0.41) MAPTTDP1NPC1CYP1A2SMN1; SMN2
SCHEMBL14035687 0.75 CYP1A2 (0.43) CYP1A2
SCHEMBL22767768 0.75 KMT2A (0.54) KMT2AMEN1MAPTTDP1ALDH1A1
SCHEMBL14035684 0.75 HSD17B10 (0.48) KMT2AMEN1MAPTTDP1ALDH1A1
SCHEMBL17522551 0.75 KMT2A (0.46) KMT2AMEN1MAPTTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080274426-A1 Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-11-06 US disclosed