SCHEMBL14036232

SCHEMBL14036232

Cc1ccc(Oc2ccc(Oc3ccc(C(C)(C)C)cc3)cc2)cc1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.71
MAPT P10636 4/20 0.65
RAB9A P51151 4/20 0.65
ALDH1A1 P00352 4/20 0.65
NPC1 O15118 3/20 0.65
HPGD P15428 1/20 0.65
MAPK1 P28482 1/20 0.65
TEAD4 Q15561 1/20 0.54
POLB P06746 2/20 0.52
TDP1 Q9NUW8 1/20 0.52
MMP13 P45452 1/20 0.47
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
KDM4E B2RXH2 1/20 0.46
CA1 P00915 1/20 0.45
CA2 P00918 1/20 0.45
CA9 Q16790 1/20 0.45
ACHE P22303 1/20 0.44
SMN1; SMN2 Q16637 2/20 0.42
HTT P42858 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8736729 1.00 TSHR (0.71) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL18746760 0.94 TSHR (0.62) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL21867712 0.94 TSHR (0.62) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL18118972 0.90 RAB9A (0.77) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL127279 0.90 RAB9A (0.77) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL427816 0.90 RAB9A (0.77) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL29377311 0.87 RAB9A (0.74) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL12387086 0.86 TEAD4 (0.54) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL3432481 0.86 TEAD4 (0.54) TSHRMAPTRAB9AALDH1A1NPC1
SCHEMBL819283 0.86 TEAD4 (0.54) TSHRMAPTRAB9AALDH1A1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022068900-A1 POSITIVE PHOTOSENSITIVE POLYAMIDE ESTER RESIN AND COMPOSITION USING SAME 明士(北京)新材料开发有限公司 2022-04-07 WO disclosed
US-7445852-B2 Magnetic substrate, laminate of magnetic substrate and method for producing thereof MITSUI CHEMICALS, INC. (JP) 2008-11-04 US disclosed