SCHEMBL1403770

SCHEMBL1403770

CCCC(C[SiH](Cl)Cl)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
AOC3 Q16853 2/20 0.40
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
LMNA P02545 1/20 0.36
HRH1 P35367 4/20 0.34
HTR2A P28223 3/20 0.34
SIGMAR1 Q99720 1/20 0.34
TSHR P16473 1/20 0.33
TAAR1 Q96RJ0 2/20 0.33
OPRM1 P35372 1/20 0.33
OPRD1 P41143 1/20 0.33
OPRK1 P41145 1/20 0.33
OPRL1 P41146 1/20 0.33
CYP2D6 P10635 1/20 0.33
CCR5 P51681 1/20 0.33
RIPK1 Q13546 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22555481 0.86 NR1I2 (0.44) HTR2ASIGMAR1OPRM1OPRD1OPRK1
SCHEMBL524108 0.84 LMNA (0.43) AOC3LMNAHRH1HTR2ATSHR
SCHEMBL1263573 0.81 AOC3 (0.48) AOC3ESR1ESR2LMNAHRH1
SCHEMBL9276354 0.79 AOC3 (0.47) AOC3ESR1ESR2LMNAHRH1
SCHEMBL6686932 0.78 AOC3 (0.43) AOC3ESR1ESR2LMNAHRH1
SCHEMBL233438 0.77 LMNA (0.48) AOC3ESR1ESR2LMNAHRH1
Ammonia Solution, Strong SCHEMBL28248687 0.75 LMNA (0.46) AOC3ESR1ESR2LMNAHRH1
Hydrogen Peroxide SCHEMBL11212534 0.75 LMNA (0.52) AOC3ESR1ESR2LMNATAAR1
SCHEMBL2052039 0.74 POLB (0.45) AOC3ESR1ESR2LMNAHRH1
SCHEMBL1144765 0.74 AOC3 (0.47) AOC3ESR1ESR2LMNAHRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11739184-B2 Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-29 US disclosed
EP-3798252-B1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME SHINETSU CHEMICAL CO (JP) 2022-06-29 EP disclosed
US-11203670-B2 Bissilylamino group-containing organic polysilazane compound, method for producing same, and composition containing same and cured product SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-21 US disclosed
EP-3730538-B1 BISSILYLAMINO GROUP-CONTAINING ORGANIC POLYSILAZANE COMPOUND, METHOD FOR PRODUCING SAME, AND COMPOSITION CONTAINING SAME AND CURED PRODUCT SHINETSU CHEMICAL CO (JP) 2021-09-08 EP disclosed
US-20210095079-A1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-04-01 US disclosed
EP-3798252-A1 POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME Shin-Etsu Chemical Co., Ltd. (JP) 2021-03-31 EP disclosed
EP-3730538-A1 BISSILYLAMINO GROUP-CONTAINING ORGANIC POLYSILAZANE COMPOUND, METHOD FOR PRODUCING SAME, AND COMPOSITION CONTAINING SAME AND CURED PRODUCT Shin-Etsu Chemical Co., Ltd. (JP) 2020-10-28 EP disclosed
US-20200332070-A1 BISSILYLAMINO GROUP-CONTAINING ORGANIC POLYSILAZANE COMPOUND, METHOD FOR PRODUCING SAME, AND COMPOSITION CONTAINING SAME AND CURED PRODUCT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-22 US disclosed
EP-2291460-A2 SURFACE-MODIFIED NANOPARTICLES 3M Innovative Properties Company (US) 2011-03-09 EP disclosed
WO-2009137592-A2 SURFACE-MODIFIED NANOPARTICLES 3M INNOVATIVE PROPERTIES COMPANY (US) 2009-11-12 WO disclosed