⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL67366 | 0.75 | — | — | |
| SCHEMBL10509279 | 0.71 | — | — | |
| SCHEMBL25450 | 0.71 | — | — | |
| SCHEMBL11739894 | 0.71 | — | — | |
| SCHEMBL3321070 | 0.71 | — | — | |
| SCHEMBL25418259 | 0.71 | ATAD2 (0.60) | — | |
| SCHEMBL28409089 | 0.70 | MEN1 (0.48) | — | |
| SCHEMBL11449181 | 0.69 | PNP (0.51) | — | |
| SCHEMBL3289753 | 0.68 | KDM3B (0.47) | — | |
| SCHEMBL3541375 | 0.68 | KDM3B (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8841062-B2 | Positive working photosensitive material | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2014-09-23 | — | — | US | claimed |
| US-20140154624-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2014-06-05 | — | — | US | claimed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | claimed |
| US-12619149-B2 | DNQ-free chemically amplified resist composition | MERCK PATENT GMBH (DE) | 2026-05-05 | — | — | US | disclosed |
| US-12393115-B2 | Positive working photosensitive material | MERCK PATENT GMBH (DE) | 2025-08-19 | — | — | US | disclosed |
| US-20250244669-A1 | COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | EMD PERFORMANCE MATERIALS CORP. | 2025-07-31 | — | — | US | disclosed |
| US-12360453-B2 | PAG-free positive chemically amplified resist composition and methods of using the same | MERCK PATENT GMBH (DE) | 2025-07-15 | — | — | US | disclosed |
| CN-114651212-B | Positive photosensitive material | 默克专利股份有限公司 | 2025-05-02 | — | — | CN | disclosed |
| EP-4433873-A2 | COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH | Merck Patent GmbH (DE) | 2024-09-25 | — | — | EP | disclosed |
| CN-112654928-B | Positive photosensitive material | 默克专利股份有限公司 | 2024-09-24 | — | — | CN | disclosed |
| CN-118642327-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-09-13 | — | — | CN | disclosed |
| EP-1910575-A2 | IMMUNOHISTOCHEMISTRY DETECTION METHOD | Dako Denmark A/S (DK) | 2008-04-16 | — | — | EP | disclosed |
| EP-1907592-A2 | MONOMERIC AND POLYMERIC LINKERS USEFUL FOR CONJUGATING BIOLOGICAL MOLECULES AND OTHER SUBSTANCES | Dako Denmark A/S (DK) | 2008-04-09 | — | — | EP | disclosed |
| WO-2007031874-A9 | METHOD OF SIMULTANEOUSLY VISUALIZING MULTIPLE BIOLOGICAL TARGETS | DAKO DENMARK AS (DK) | 2007-05-31 | — | — | WO | disclosed |
| WO-2007045998-A2 | NEW NUCLEIC ACID BASE PAIRS | DAKO DENMARK A/S (US) | 2007-04-26 | — | — | WO | disclosed |
| WO-2007031874-A2 | METHOD OF SIMULTANEOUSLY VISUALIZING MULTIPLE BIOLOGICAL TARGETS | DAKO DENMARK A/S (US) | 2007-03-22 | — | — | WO | disclosed |
| WO-2007026252-A2 | IN SITU HYBRIDIZATION DETECTION METHOD | DAKO DENMARK A/S (US) | 2007-03-08 | — | — | WO | disclosed |
| WO-2007023390-A2 | IMMUNOHISTOCHEMISTRY DETECTION METHOD | DAKO DENMARK A/S (US) | 2007-03-01 | — | — | WO | disclosed |
| WO-2007015168-A2 | MONOMERIC AND POLYMERIC LINKERS USEFUL FOR CONJUGATING BIOLOGICAL MOLECULES AND OTHER SUBSTANCES | DAKO DENMARK A/S (US) | 2007-02-08 | — | — | WO | disclosed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | disclosed |