SCHEMBL3321070

SCHEMBL3321070

Nc1c[nH]c(=S)[nH]c1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65085 0.75
SCHEMBL18783134 0.73 DPYD (0.50)
SCHEMBL23211189 0.73 DPYD (0.50)
Potassium SCHEMBL29524710 0.73 DPYD (0.50)
Hydrochloric Acid SCHEMBL29256236 0.73 DPYD (0.50)
SCHEMBL11739894 0.71
SCHEMBL10509279 0.71
SCHEMBL1404492 0.71
SCHEMBL25418259 0.71 ATAD2 (0.60)
SCHEMBL25450 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8841062-B2 Positive working photosensitive material AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-09-23 US claimed
US-20140154624-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-06-05 US claimed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US claimed
US-12619149-B2 DNQ-free chemically amplified resist composition MERCK PATENT GMBH (DE) 2026-05-05 US disclosed
WO-2026028829-A1 VINYL-CHLORIDE-BASED RESIN COMPOSITION AND VINYL-CHLORIDE-BASED RESIN MOLDED BODY 積水化学工業株式会社 2026-02-05 WO disclosed
US-12393115-B2 Positive working photosensitive material MERCK PATENT GMBH (DE) 2025-08-19 US disclosed
US-20250244669-A1 COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH EMD PERFORMANCE MATERIALS CORP. 2025-07-31 US disclosed
US-12360453-B2 PAG-free positive chemically amplified resist composition and methods of using the same MERCK PATENT GMBH (DE) 2025-07-15 US disclosed
EP-4433873-A2 COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH Merck Patent GmbH (DE) 2024-09-25 EP disclosed
US-20240045333-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROFILE AND DEPTH OF FOCUS (DOF) MERCK PATENT GMBH (DE) 2024-02-08 US disclosed
US-11822242-B2 DNQ-type photoresist composition including alkali-soluble acrylic resins MERCK PATENT GMBH (DE) 2023-11-21 US disclosed
EP-1996649-A1 STABILIZER COMPOSITIONS FOR HALOGENATED POLYMERS WITH IMPROVED INITIAL COLOR AND IMPROVED COLOR MAINTENANCE Baerlocher GmbH (DE) 2008-12-03 EP disclosed
WO-2007104379-A1 STABILIZER COMPOSITIONS FOR HALOGENATED POLYMERS WITH IMPROVED INITIAL COLOR AND IMPROVED COLOR MAINTENANCE BAERLOCHER GMBH (DE) 2007-09-20 WO disclosed
US-7053076-B2 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. (US) 2006-05-30 US disclosed
US-20060030551-A1 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. 2006-02-09 US disclosed
US-20030130246-A1 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. 2003-07-10 US disclosed
WO-2003020214-A2 BILE-ACID DERIVED COMPOUNDS FOR ENHANCING ORAL ABSORPTION AND SYSTEMIC BIOAVAILABILITY OF DRUGS XENOPORT, INC. (US) 2003-03-13 WO disclosed
EP-1288238-A1 Compositions of matter having bioactive properties Schmitz, Robert A. (US) 2003-03-05 EP disclosed
US-6299892-B1 INCORPORATING INTO DELIVERY VEHICLES SUITABLE FOR EFFECTING DESIRED ANTIMICROBIAL USE, SOAPS AND DETERGENTS SCHMITZ ROBERT A (US) 2001-10-09 US disclosed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 US disclosed