SCHEMBL3321070

SCHEMBL3321070

Nc1c[nH]c(=S)[nH]c1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65085 0.75 — —
SCHEMBL23211189 0.73 DPYD (0.50) —
Potassium SCHEMBL29524710 0.73 DPYD (0.50) —
SCHEMBL18783134 0.73 DPYD (0.50) —
Hydrochloric Acid SCHEMBL29256236 0.73 DPYD (0.50) —
SCHEMBL1404492 0.71 — —
SCHEMBL11739894 0.71 — —
SCHEMBL25418259 0.71 ATAD2 (0.60) —
SCHEMBL10509279 0.71 — —
SCHEMBL25450 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8841062-B2 Positive working photosensitive material AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) 2014-09-23 — — US claimed
US-20140154624-A1 POSITIVE WORKING PHOTOSENSITIVE MATERIAL AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) 2014-06-05 — — US claimed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 — — US claimed
US-12619149-B2 DNQ-free chemically amplified resist composition MERCK PATENT GMBH (DE) 2026-05-05 — — US disclosed
WO-2026028829-A1 VINYL-CHLORIDE-BASED RESIN COMPOSITION AND VINYL-CHLORIDE-BASED RESIN MOLDED BODY 積水化学工業株式会社 2026-02-05 — — WO disclosed
US-12393115-B2 Positive working photosensitive material MERCK PATENT GMBH (DE) 2025-08-19 — — US disclosed
US-20250244669-A1 COMPOSITIONS AND METHODS OF IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH EMD PERFORMANCE MATERIALS CORP. 2025-07-31 — — US disclosed
US-12360453-B2 PAG-free positive chemically amplified resist composition and methods of using the same MERCK PATENT GMBH (DE) 2025-07-15 — — US disclosed
EP-4433873-A2 COMPOSITIONS AND METHODS FOR IMPROVING METAL STRUCTURE FABRICATION BY WET CHEMICAL ETCH Merck Patent GmbH (DE) 2024-09-25 — — EP disclosed
US-20240045333-A1 POSITIVE-WORKING PHOTORESIST COMPOSITION WITH IMPROVED PATTERN PROFILE AND DEPTH OF FOCUS (DOF) MERCK PATENT GMBH (DE) 2024-02-08 — — US disclosed
US-11822242-B2 DNQ-type photoresist composition including alkali-soluble acrylic resins MERCK PATENT GMBH (DE) 2023-11-21 — — US disclosed
EP-1996649-A1 STABILIZER COMPOSITIONS FOR HALOGENATED POLYMERS WITH IMPROVED INITIAL COLOR AND IMPROVED COLOR MAINTENANCE Baerlocher GmbH (DE) 2008-12-03 — — EP disclosed
WO-2007104379-A1 STABILIZER COMPOSITIONS FOR HALOGENATED POLYMERS WITH IMPROVED INITIAL COLOR AND IMPROVED COLOR MAINTENANCE BAERLOCHER GMBH (DE) 2007-09-20 — — WO disclosed
US-7053076-B2 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. (US) 2006-05-30 — — US disclosed
US-20060030551-A1 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. 2006-02-09 — — US disclosed
US-20030130246-A1 Bile-acid derived compounds for enhancing oral absorption and systemic bioavailability of drugs XENOPORT, INC. 2003-07-10 — — US disclosed
WO-2003020214-A2 BILE-ACID DERIVED COMPOUNDS FOR ENHANCING ORAL ABSORPTION AND SYSTEMIC BIOAVAILABILITY OF DRUGS XENOPORT, INC. (US) 2003-03-13 — — WO disclosed
EP-1288238-A1 Compositions of matter having bioactive properties Schmitz, Robert A. (US) 2003-03-05 — — EP disclosed
US-6299892-B1 INCORPORATING INTO DELIVERY VEHICLES SUITABLE FOR EFFECTING DESIRED ANTIMICROBIAL USE, SOAPS AND DETERGENTS SCHMITZ ROBERT A (US) 2001-10-09 — — US disclosed
US-4002479-A ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT FUJI PHOTO FILM CO., LTD. (JA) 1977-01-11 — — US disclosed
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