SCHEMBL14093868

SCHEMBL14093868

CN(O)C(=O)NNc1ccc(NC(=O)Nc2cccc(-n3c(S)nnc3S)c2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CNR1 P21554 3/20 0.39
▸ KMT2A Q03164 5/20 0.39
▸ MEN1 O00255 4/20 0.39
▸ MAPT P10636 3/20 0.39
▸ TP53 P04637 3/20 0.39
▸ TSHR P16473 3/20 0.39
▸ NPC1 O15118 2/20 0.39
▸ RAB9A P51151 2/20 0.39
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ LMNA P02545 2/20 0.39
▸ NFKB1 P19838 1/20 0.39
▸ NFKB2 Q00653 1/20 0.39
▸ RELA Q04206 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ NOX1 Q9Y5S8 1/20 0.39
▸ BAZ1A Q9NRL2 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.36
▸ PKM P14618 1/20 0.36
▸ POLB P06746 1/20 0.36
▸ ACHE P22303 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14344015 0.89 POLB (0.41) CNR1KMT2AMEN1MAPTTP53
SCHEMBL13656906 0.85 POLB (0.42) KMT2AMEN1TP53POLB
SCHEMBL14093920 0.84 CNR1 (0.40) CNR1KMT2AMEN1MAPTTP53
SCHEMBL13297738 0.76 POLB (0.42) CNR1KMT2AMEN1MAPTNPC1
SCHEMBL14093876 0.75 SMN1; SMN2 (0.41) KMT2AMEN1MAPTTP53NPC1
SCHEMBL13656912 0.74 GAA (0.48) KMT2AMEN1MAPTTSHRRAB9A
SCHEMBL14093923 0.74 ALDH1A1 (0.50) MAPTTSHRNPC1RAB9ASMN1; SMN2
SCHEMBL14093856 0.74 POLB (0.36) KMT2AMAPTTP53NPC1RAB9A
SCHEMBL14093922 0.72 GAA (0.38) NPC1RAB9ASMN1; SMN2
SCHEMBL13295062 0.69 ALDH1A1 (0.40) MAPTTP53NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1431813-B1 Photothermographic material with high iodide content and image forming method using same FUJI PHOTO FILM CO LTD (JP) 2007-02-14 — — EP disclosed
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