SCHEMBL14344015

SCHEMBL14344015

CN(O)C(=O)NNC(=O)c1ccc(NC(=O)Nc2cccc(-n3c(S)nnc3S)c2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.41
▸ HPSE Q9Y251 2/20 0.40
▸ KDM4E B2RXH2 2/20 0.39
▸ CTDSP1 Q9GZU7 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ KMT2A Q03164 5/20 0.39
▸ TP53 P04637 4/20 0.39
▸ ALDH1A1 P00352 3/20 0.39
▸ SIRT1 Q96EB6 1/20 0.38
▸ HPGD P15428 2/20 0.38
▸ HTT P42858 2/20 0.38
▸ NPC1 O15118 5/20 0.37
▸ RAB9A P51151 5/20 0.37
▸ MEN1 O00255 3/20 0.37
▸ MAPT P10636 3/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ CNR1 P21554 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ NFKB1 P19838 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093868 0.89 CNR1 (0.39) POLBKMT2ATP53ALDH1A1NPC1
SCHEMBL14093876 0.84 SMN1; SMN2 (0.41) POLBKDM4ETDP1KMT2ATP53
SCHEMBL13656906 0.82 POLB (0.42) POLBKDM4EKMT2ATP53MEN1
SCHEMBL14093920 0.75 CNR1 (0.40) KMT2ATP53ALDH1A1HTTNPC1
SCHEMBL13297738 0.73 POLB (0.42) POLBKMT2AALDH1A1HTTNPC1
SCHEMBL13656912 0.72 GAA (0.48) POLBKDM4ETDP1KMT2AALDH1A1
SCHEMBL14093923 0.72 ALDH1A1 (0.50) POLBALDH1A1NPC1RAB9AMAPT
SCHEMBL14093856 0.72 POLB (0.36) POLBKMT2ATP53ALDH1A1HTT
SCHEMBL14093922 0.70 GAA (0.38) KDM4ENPC1RAB9ASMN1; SMN2
SCHEMBL14360703 0.69 KDM4E (0.42) POLBKDM4ECTDSP1TDP1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
EP-1441254-B1 Photothermographic material FUJIFILM CORP (JP) 2007-03-28 — — EP disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 — — EP disclosed
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