SCHEMBL14099573

SCHEMBL14099573

CCN(c1ccccc1)c1ccc(/C=C2/Sc3ccccc3C2=O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 15/20 0.59
MEN1 O00255 12/20 0.59
KMT2A Q03164 12/20 0.59
SMN1; SMN2 Q16637 5/20 0.59
NPC1 O15118 2/20 0.55
POLB P06746 4/20 0.54
KDM4E B2RXH2 5/20 0.49
ALDH1A1 P00352 5/20 0.49
HSD17B10 Q99714 1/20 0.49
CYP1A2 P05177 3/20 0.47
CYP2C19 P33261 3/20 0.47
CYP3A4 P08684 2/20 0.47
CYP2C9 P11712 2/20 0.47
RAB9A P51151 2/20 0.47
HCRTR1 O43613 1/20 0.47
CYP2D6 P10635 1/20 0.47
NFKB1 P19838 1/20 0.47
NFKB2 Q00653 1/20 0.47
RELA Q04206 1/20 0.47
MAPK1 P28482 3/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3134637 0.80 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL3134644 0.80 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL26277062 0.80 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL14099570 0.80 MAPT (0.67) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL14099559 0.79 MAPT (0.55) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL12692508 0.78 MAPT (0.64) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL14021100 0.77 MAPT (0.57) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL12204420 0.75 MAPT (0.60) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL12692428 0.75 TYR (0.65) MAPTMEN1KMT2ASMN1; SMN2NPC1
SCHEMBL14139632 0.75 MAPT (0.60) MAPTMEN1KMT2ASMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7396634-B2 Photosensitive composition FUJIFILM CORPORATION (JP) 2008-07-08 US disclosed
US-7396634-B2 Photosensitive composition FUJIFILM CORPORATION (JP) 2008-07-08 US disclosed