SCHEMBL14099570

SCHEMBL14099570

CCCCN(CCCC)c1ccc(/C=C2/Sc3ccccc3C2=O)cc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 14/20 0.67
MEN1 O00255 12/20 0.67
KMT2A Q03164 12/20 0.67
SMN1; SMN2 Q16637 4/20 0.67
POLB P06746 3/20 0.55
NPC1 O15118 3/20 0.53
KDM4E B2RXH2 4/20 0.48
ALDH1A1 P00352 4/20 0.48
CYP1A2 P05177 3/20 0.48
CYP2C19 P33261 3/20 0.48
CYP3A4 P08684 2/20 0.48
CYP2C9 P11712 2/20 0.48
AR P10275 1/20 0.47
HSD17B10 Q99714 1/20 0.47
RAB9A P51151 3/20 0.45
HCRTR1 O43613 1/20 0.45
CYP2D6 P10635 1/20 0.45
NFKB1 P19838 1/20 0.45
NFKB2 Q00653 1/20 0.45
RELA Q04206 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14021100 0.85 MAPT (0.57) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL14099573 0.80 MAPT (0.59) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL28460266 0.79 AR (0.59) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL14099559 0.77 MAPT (0.55) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL12692508 0.76 MAPT (0.64) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL3134637 0.75 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL26277062 0.75 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL3134644 0.75 MAPT (0.69) MAPTMEN1KMT2ASMN1; SMN2POLB
SCHEMBL1453994 0.73 MAOB (0.67) MAPTMEN1KMT2AKDM4EALDH1A1
SCHEMBL1453992 0.73 MAOB (0.67) MAPTMEN1KMT2AKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7396634-B2 Photosensitive composition FUJIFILM CORPORATION (JP) 2008-07-08 US disclosed
US-7396634-B2 Photosensitive composition FUJIFILM CORPORATION (JP) 2008-07-08 US disclosed