SCHEMBL14130390

SCHEMBL14130390

COc1ccc(/N=N/c2ccc(NC(=O)c3ccc(C(=O)Nc4ccc(/N=N/c5ccc(OC)cc5)cc4)cc3)cc2)cc1

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 11/20 0.81
▸ NPC1 O15118 10/20 0.81
▸ SMN1; SMN2 Q16637 6/20 0.81
▸ TP53 P04637 4/20 0.81
▸ ALOX15 P16050 1/20 0.81
▸ ALDH1A1 P00352 5/20 0.66
▸ CYP1A2 P05177 2/20 0.66
▸ KDM4E B2RXH2 1/20 0.66
▸ HDAC1 Q13547 1/20 0.64
▸ KMT2A Q03164 5/20 0.64
▸ MEN1 O00255 2/20 0.64
▸ GAA P10253 2/20 0.64
▸ CYP2C9 P11712 2/20 0.64
▸ CYP3A4 P08684 1/20 0.64
▸ CYP2D6 P10635 1/20 0.64
▸ CYP2C19 P33261 1/20 0.64
▸ CASP3 P42574 1/20 0.60
▸ SENP7 Q9BQF6 1/20 0.60
▸ LMNA P02545 2/20 0.59
▸ POLB P06746 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130400 0.92 NPC1 (0.68) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL6799157 0.90 RAB9A (1.00) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL10311785 0.89 RAB9A (0.78) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL14130389 0.88 NPC1 (0.66) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL11142807 0.87 RAB9A (0.66) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL8770881 0.85 RAB9A (0.89) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL30341896 0.85 RAB9A (0.89) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL22192206 0.85 RAB9A (0.89) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL8769709 0.85 RAB9A (0.89) RAB9ANPC1SMN1; SMN2TP53ALOX15
SCHEMBL6361263 0.85 RAB9A (0.89) RAB9ANPC1SMN1; SMN2TP53ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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