SCHEMBL14130414

SCHEMBL14130414

COc1ccc(/N=N/c2ccc(OC(=O)c3cccc(C(=O)Oc4ccc(/N=N/c5ccc(OC)cc5)cc4)c3)cc2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACR P10323 4/20 0.56
PRSS1 P07477 3/20 0.56
KMT2A Q03164 6/20 0.54
ESR1 P03372 1/20 0.54
ESR2 Q92731 1/20 0.54
GAA P10253 1/20 0.53
NPSR1 Q6W5P4 1/20 0.53
LMNA P02545 1/20 0.51
CYP1A2 P05177 1/20 0.51
CYP2C9 P11712 1/20 0.51
CYP2C19 P33261 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
MEN1 O00255 3/20 0.50
CASP3 P42574 1/20 0.50
SENP8 Q96LD8 1/20 0.50
SENP7 Q9BQF6 1/20 0.50
SENP6 Q9GZR1 1/20 0.50
MAPT P10636 3/20 0.49
GFER P55789 1/20 0.49
TDP1 Q9NUW8 2/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130077 0.92 ACR (0.60) ACRPRSS1KMT2ALMNACYP1A2
SCHEMBL14130182 0.87 MAPT (0.52) ACRPRSS1KMT2AGAAMEN1
SCHEMBL14130421 0.87 PRSS1 (0.71) ACRPRSS1KMT2ALMNACYP1A2
SCHEMBL10022910 0.84 KMT2A (0.56) KMT2AESR1ESR2GAANPSR1
SCHEMBL14130018 0.83 MAPT (0.63) ACRPRSS1KMT2AGAALMNA
SCHEMBL14130171 0.80 NSD2 (0.59) ACRPRSS1KMT2AMEN1CASP3
SCHEMBL12762433 0.80 KMT2A (0.52) KMT2AESR1ESR2GAANPSR1
SCHEMBL12762426 0.80 MAPT (0.59) KMT2AESR1ESR2GAANPSR1
SCHEMBL22588978 0.80 TSHR (0.53) ACRPRSS1KMT2AESR1ESR2
SCHEMBL27677192 0.78 MAPT (0.61) ACRPRSS1KMT2AGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed