SCHEMBL14133263

SCHEMBL14133263

C=C(C)C(=O)OCCOC(=O)C(F)(F)C(F)(F)C(=O)O

nearest known ligand 0.49

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.49
TSHR P16473 3/20 0.43
POLB P06746 1/20 0.37
APEX1 P27695 1/20 0.37
HTT P42858 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
ALDH1A1 P00352 2/20 0.35
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13557333 0.93 THRB (0.55) THRBTSHRPOLBAPEX1HTT
SCHEMBL2632792 0.86 THRB (0.52) THRBTSHRPOLBAPEX1HTT
SCHEMBL25789190 0.84 THRB (0.50) THRBTSHRPOLBAPEX1HTT
SCHEMBL2632775 0.83 THRB (0.49) THRBTSHRPOLBAPEX1HTT
SCHEMBL26002889 0.82 THRB (0.45) THRBTSHRPOLBAPEX1HTT
SCHEMBL13557337 0.82 THRB (0.55) THRBTSHRPOLBAPEX1HTT
SCHEMBL4568739 0.82 THRB (0.55) THRBTSHRPOLBAPEX1HTT
SCHEMBL26002879 0.81 THRB (0.47) THRBTSHRPOLBAPEX1HTT
SCHEMBL18922857 0.81 THRB (0.47) THRBTSHRPOLBAPEX1HTT
SCHEMBL4568736 0.80 THRB (0.53) THRBTSHRPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8323872-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-04 US disclosed
US-8323872-B2 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-04 US disclosed
US-20070003867-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-04 US disclosed
US-20070003867-A1 Resist protective coating material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-01-04 US disclosed