Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.67 |
| ▸ | TSHR | P16473 | 2/20 | 0.62 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.62 |
| ▸ | MEN1 | O00255 | 3/20 | 0.59 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.59 |
| ▸ | THRB | P10828 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | SLCO1B3 | Q9NPD5 | 1/20 | 0.32 |
| ▸ | SLCO1B1 | Q9Y6L6 | 1/20 | 0.32 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.31 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Triethylene Glycol SCHEMBL272568 | 0.97 | MEN1 (0.65) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Hexaethylene Glycol SCHEMBL11969850 | 0.97 | MEN1 (0.65) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Tetraethylene Glycol SCHEMBL316250 | 0.97 | MEN1 (0.65) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Pentaethylene Glycol SCHEMBL11969734 | 0.97 | MEN1 (0.65) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL5916071 | 0.94 | ALDH1A1 (0.60) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL3457513 | 0.94 | ALDH1A1 (0.68) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL6568384 | 0.94 | ALDH1A1 (0.60) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Tetraethylene Glycol SCHEMBL21439800 | 0.94 | MEN1 (0.61) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL28430914 | 0.94 | ALDH1A1 (0.60) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL9815325 | 0.94 | ALDH1A1 (0.68) | ALDH1A1TSHRMAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 11818 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122095313-A | Light-converting curable composition, cured film comprising the same, and image display device comprising the cured film | — | 2026-05-26 | — | — | CN | claimed |
| CN-122058085-A | Solder alloy, solder paste, preparation method thereof, solder and welding structural part | 天合光能股份有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-122063815-A | Positive photosensitive resin composition and interlayer insulating film | 阜阳欣奕华新材料科技股份有限公司 | 2026-05-19 | — | — | CN | claimed |
| CN-122043860-A | Low-haze low-temperature curing negative photosensitive resin composition, preparation method thereof and hardening film | 深圳市道尔顿电子材料股份有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-4742352-A1 | ELECTROLYTE FOR LITHIUM-SULFUR BATTERY | LG Energy Solution, Ltd. (KR) | 2026-05-13 | — | — | EP | claimed |
| CN-122025837-A | Plasticizer synergistic modified low-temperature polymer electrolyte and low-temperature silicon-based negative lithium ion battery using same | 中国科学院长春应用化学研究所 | 2026-05-12 | — | — | CN | claimed |
| CN-115668572-B | Electrolyte for lithium-sulfur battery and lithium-sulfur battery comprising same | 株式会社LG新能源 | 2026-05-12 | — | — | CN | claimed |
| CN-113050372-B | Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device | 日铁化学材料株式会社 | 2026-05-12 | — | — | CN | claimed |
| US-20260117393-A1 | ETCHING AGENT COMPOSITION AND ETCHING METHOD USING THE SAME | KCTECH CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| CN-119119472-B | Negative photosensitive polyimide resin, preparation method thereof, photoresist composition and application | 华东理工大学 | 2026-02-27 | — | — | CN | claimed |
| US-6855196-B2 | Ink for a display panel and method for producing plasma display panel using the ink | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-02-15 | — | — | US | claimed |
| WO-2004099876-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM RESIST USING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2004-11-18 | — | — | WO | claimed |
| US-20030096056-A1 | Ink for a display panel and method for producing plasma display panel using the ink | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2003-05-22 | — | — | US | claimed |
| US-20030089275-A1 | Ink for display panel and method for producing plasma display panel using the same | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (US) | 2003-05-15 | — | — | US | claimed |
| US-6372410-B1 | FOR USE IN PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUITS; FOR REMOVING RESIST RESIDUES REMAINING AFTER ETCHING OR ASHING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-04-16 | — | — | US | claimed |
| EP-1091254-A2 | Resist stripping composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-04-11 | — | — | EP | claimed |
| US-5437952-A | Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin | KONICA CORPORATION (JP) | 1995-08-01 | — | — | US | claimed |
| EP-0343689-B1 | METHOD FOR PLUGGING LOST CIRCULATION AREAS | TOHO KAGAKU KOGYO CO. LTD (JP) | 1993-02-03 | — | — | EP | claimed |
| US-4958685-A | OIL AND GAS WELLS; POLYURETHANE AND SOLVENT SANDWICHED BY A SPACER OF MINERAL OILS | TOHO KAGAKU KOGYO CO., LTD. (JP) | 1990-09-25 | — | — | US | claimed |
| EP-0343689-A2 | Method for plugging lost circulation areas | TOHO KAGAKU KOGYO CO. LTD (JP) | 1989-11-29 | — | — | EP | claimed |