⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14204583 | 1.00 | — | — | |
| SCHEMBL14204553 | 0.79 | — | — | |
| SCHEMBL13856063 | 0.73 | — | — | |
| SCHEMBL11074890 | 0.68 | — | — | |
| SCHEMBL14204563 | 0.68 | — | — | |
| SCHEMBL16904983 | 0.68 | — | — | |
| SCHEMBL16905009 | 0.68 | — | — | |
| SCHEMBL75137 | 0.68 | ALDH1A1 (0.30) | — | |
| SCHEMBL24298546 | 0.67 | — | — | |
| SCHEMBL24095426 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11009790-B2 | Photoacid generator and photoresist composition including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-05-18 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |
| US-20180031967-A1 | PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-02-01 | — | — | US | disclosed |