Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 9/20 | 0.35 |
| ▸ | CTSL | P07711 | 4/20 | 0.35 |
| ▸ | CTSB | P07858 | 4/20 | 0.35 |
| ▸ | KLK7 | P49862 | 3/20 | 0.35 |
| ▸ | CTSH | P09668 | 2/20 | 0.34 |
| ▸ | CTSS | P25774 | 1/20 | 0.34 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.34 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.34 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.34 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.34 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13856086 | 0.89 | TDP1 (0.36) | CTSKCTSLCTSBKLK7CTSH | |
| SCHEMBL14204595 | 0.89 | CTSK (0.36) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL15116342 | 0.81 | CTSK (0.37) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL23963426 | 0.80 | CTSK (0.36) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL15116337 | 0.80 | CTSK (0.35) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL20215412 | 0.79 | CTSK (0.36) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL75555 | 0.78 | CTSK (0.35) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL13856079 | 0.78 | CTSK (0.36) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL23963424 | 0.78 | CTSK (0.34) | CTSKCTSLCTSBCTSHCTSS | |
| SCHEMBL20215411 | 0.77 | CTSK (0.34) | CTSKCTSLCTSBCTSHCTSS |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |
| US-20080090173-A1 | POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-17 | — | — | US | disclosed |