Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSK | P43235 | 4/20 | 0.34 |
| ▸ | CTSS | P25774 | 1/20 | 0.34 |
| ▸ | CTSL | P07711 | 2/20 | 0.32 |
| ▸ | CTSB | P07858 | 2/20 | 0.32 |
| ▸ | CTSH | P09668 | 2/20 | 0.32 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.30 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.30 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.30 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20215412 | 0.99 | CTSK (0.36) | CTSKCTSSCTSLCTSBCTSH | |
| SCHEMBL15116337 | 0.86 | CTSK (0.35) | CTSKCTSSCTSLCTSBCTSH | |
| SCHEMBL15116342 | 0.85 | CTSK (0.37) | CTSKCTSSCTSLCTSBCTSH | |
| SCHEMBL18473870 | 0.80 | CYP2D6 (0.31) | — | |
| SCHEMBL14204595 | 0.80 | CTSK (0.36) | CTSKCTSSCTSLCTSBCTSH | |
| SCHEMBL20215381 | 0.79 | — | — | |
| SCHEMBL18476621 | 0.78 | PDK1 (0.34) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL20215414 | 0.78 | EPHX2 (0.32) | — | |
| SCHEMBL20215392 | 0.77 | PDK1 (0.36) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL15113930 | 0.77 | CTSK (0.34) | CTSKCTSSCTSLCTSBCTSH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| US-9989847-B2 | Onium salt compound, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-06-05 | — | — | US | disclosed |