Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.36 |
| ▸ | HMGCR | P04035 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HPGD | P15428 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | GFER | P55789 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6367094 | 0.78 | EPHX2 (0.36) | EPHX2GRM1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL106940 | 0.78 | EPHX2 (0.36) | EPHX2GRM1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL3410109 | 0.78 | ALDH1A1 (0.36) | EPHX2GRM1CYP19A1ALDH1A1ATM | |
| SCHEMBL107020 | 0.77 | EPHX2 (0.37) | EPHX2GRM1ALDH1A1MAPTHPGD | |
| SCHEMBL6367599 | 0.77 | EPHX2 (0.35) | EPHX2GRM1HSD11B1ALDH1A1NPC1 | |
| SCHEMBL12972013 | 0.77 | CYP19A1 (0.35) | EPHX2CYP19A1HSD11B1ALDH1A1NPC1 | |
| SCHEMBL14213231 | 0.76 | HMGCR (0.31) | HMGCR | |
| SCHEMBL18802894 | 0.76 | EPHX2 (0.36) | EPHX2GRM1ALDH1A1MAPTHPGD | |
| SCHEMBL47411 | 0.76 | GRM1 (0.39) | EPHX2GRM1HMGCRCYP19A1HSD11B1 | |
| SCHEMBL2607560 | 0.75 | HMGCR (0.43) | EPHX2GRM1HMGCRHSD11B1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-8945812-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8911928-B2 | Resist composition, method of forming resist pattern, polymeric compound and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-12-16 | — | — | US | disclosed |
| US-20130244176-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-19 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120308928-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |