SCHEMBL14213233

SCHEMBL14213233

CCC(C)(C)C(=O)OCC(O)(CC)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.34
LMNA P02545 1/20 0.33
MEN1 O00255 3/20 0.33
KMT2A Q03164 3/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
MAPT P10636 1/20 0.31
ATM Q13315 1/20 0.31
GLA P06280 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2D6 P10635 1/20 0.30
CYP2C9 P11712 1/20 0.30
CYP2C19 P33261 1/20 0.30
HMGCR P04035 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14213218 0.87 ALDH1A1 (0.35) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL15257148 0.86 MEN1 (0.34) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL14213235 0.81 ALDH1A1 (0.33) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL14213226 0.80 ALDH1A1 (0.33) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL3407059 0.78 ALDH1A1 (0.36) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL14213223 0.78 MEN1 (0.35) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL10148640 0.77 KMT2A (0.34) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL12134112 0.77 ALDH1A1 (0.39) ALDH1A1MEN1KMT2AL3MBTL1MAPT
SCHEMBL47390 0.75 KMT2A (0.35) ALDH1A1LMNAMEN1KMT2AL3MBTL1
SCHEMBL10189214 0.75 ALDH1A1 (0.55) ALDH1A1LMNAMEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8987386-B2 Method of producing polymeric compound, resist composition, and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2015-03-24 US disclosed
US-8911928-B2 Resist composition, method of forming resist pattern, polymeric compound and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2014-12-16 US disclosed
US-20120328993-A1 METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-27 US disclosed
US-20120308928-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND AND METHOD OF PRODUCING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2012-12-06 US disclosed