SCHEMBL14217323

SCHEMBL14217323

Cc1cc2sc(-c3sc4c(ccc5c4ccc4c(C)c(C)sc45)c3C)cc2s1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14217303 0.81
SCHEMBL14217316 0.76 NPC1 (0.32)
SCHEMBL14217314 0.75 ALDH1A1 (0.32)
SCHEMBL14217311 0.70
SCHEMBL14217327 0.70 ADORA2A (0.33)
SCHEMBL23555963 0.69 ALDH1A1 (0.33)
SCHEMBL14217312 0.69
SCHEMBL20043796 0.68 PKM (0.41)
SCHEMBL14479816 0.68 ALDH1A1 (0.37)
SCHEMBL13407303 0.68 ALDH1A1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921836-B2 Polymer compound, and thin film and ink composition each containing same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-30 US disclosed
US-20120305899-A1 POLYMER COMPOUND, AND THIN FILM AND INK COMPOSITION EACH CONTAINING SAME NATIONAL UNIVERSITY OF CORPORATION HIROSHIMA UNIVERSITY (JP) 2012-12-06 US disclosed