SCHEMBL14217328

SCHEMBL14217328

Cc1cc2ccc3c(ccc4cc(-c5sc(-c6sc(-c7cc(C)c(-c8cc(C)c(C)s8)s7)cc6C)cc5C)sc43)c2s1

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14217322 1.00 ESR1 (0.30) ESR1ESR2
SCHEMBL17487322 0.83
SCHEMBL19240271 0.82
SCHEMBL12619512 0.79 ESR1 (0.32) ESR1ESR2
SCHEMBL12982698 0.76 ESR1 (0.41) ESR1ESR2
SCHEMBL10441966 0.76 ALDH1A1 (0.33)
SCHEMBL14217312 0.75
SCHEMBL15730461 0.74 ESR1 (0.32) ESR1ESR2
SCHEMBL14217306 0.74 PKM (0.30)
SCHEMBL13711884 0.74 ESR1 (0.37) ESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921836-B2 Polymer compound, and thin film and ink composition each containing same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-12-30 US disclosed
US-20120305899-A1 POLYMER COMPOUND, AND THIN FILM AND INK COMPOSITION EACH CONTAINING SAME NATIONAL UNIVERSITY OF CORPORATION HIROSHIMA UNIVERSITY (JP) 2012-12-06 US disclosed