SCHEMBL14248010

SCHEMBL14248010

c1cc(N2CCOCC2)ccn1.c1ccc(N2CCOCC2)cc1

nearest known ligand 0.73

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.73
CHKA P35790 1/20 0.57
MAPT P10636 5/20 0.53
HTT P42858 3/20 0.53
KDM4E B2RXH2 1/20 0.53
ALOX12 P18054 1/20 0.53
PLOD2 O00469 1/20 0.52
PLOD3 O60568 1/20 0.52
PLOD1 Q02809 1/20 0.52
ADRB2 P07550 1/20 0.52
NCF1 P14598 1/20 0.52
PLD1 Q13393 1/20 0.52
ALDH1A1 P00352 3/20 0.51
PKM P14618 1/20 0.51
TSHR P16473 1/20 0.51
CYP2C9 P11712 1/20 0.51
CYP2C19 P33261 1/20 0.51
AKR1C3 P42330 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
MEN1 O00255 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL49166 0.92 CHKA (0.67) LMNACHKAMAPTHTTKDM4E
Hydrochloric Acid SCHEMBL8912436 0.90 CHKA (0.64) LMNACHKAMAPTHTTKDM4E
SCHEMBL18590696 0.87 CHKA (0.67) LMNACHKAMAPTKDM4EADRB2
SCHEMBL254812 0.87 LMNA (0.95) LMNAMAPTHTTKDM4EALOX12
SCHEMBL3948094 0.87 LMNA (0.95) LMNAMAPTHTTKDM4EALOX12
SCHEMBL2555823 0.87 LMNA (0.95) LMNAMAPTHTTKDM4EALOX12
SCHEMBL4408839 0.85 LMNA (0.91) LMNAMAPTHTTKDM4EALOX12
Ammonia Solution, Strong SCHEMBL4262260 0.85 LMNA (0.91) LMNAMAPTHTTKDM4EALOX12
SCHEMBL184087 0.85 LMNA (0.91) LMNAMAPTHTTKDM4EALOX12
SCHEMBL13809379 0.85 LMNA (1.00) LMNAMAPTHTTKDM4EALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2721446-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN Fujifilm Corporation (JP) 2014-04-23 EP disclosed
WO-2012173282-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-12-20 WO disclosed