SCHEMBL14252147

SCHEMBL14252147

CSc1c(F)c(F)c(S(=O)(=O)ON2C(=O)C3C4C=CC(C4)C3C2=O)c(F)c1F

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
TDP1 Q9NUW8 1/20 0.36
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
POLB P06746 1/20 0.33
HTT P42858 3/20 0.33
SMN1; SMN2 Q16637 4/20 0.33
PKM P14618 1/20 0.33
KDM4E B2RXH2 1/20 0.33
RAB9A P51151 1/20 0.33
LMNA P02545 1/20 0.32
RECQL P46063 1/20 0.32
TSHR P16473 2/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2C19 P33261 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19861151 0.88 ALDH1A1 (0.42) ALDH1A1TDP1MEN1KMT2APOLB
SCHEMBL547495 0.88 ALDH1A1 (0.42) ALDH1A1TDP1MEN1KMT2APOLB
SCHEMBL14252044 0.84 KMT2A (0.41) ALDH1A1TDP1MEN1KMT2APOLB
SCHEMBL14252042 0.82 ALDH1A1 (0.39) ALDH1A1TDP1MEN1KMT2AHTT
SCHEMBL20176709 0.80 POLB (0.37) ALDH1A1TDP1KMT2APOLBSMN1; SMN2
SCHEMBL2734945 0.74 CYP3A4 (0.43) ALDH1A1TDP1MEN1KMT2APOLB
SCHEMBL3189821 0.73 MEN1 (0.50) ALDH1A1TDP1MEN1KMT2APOLB
SCHEMBL4829749 0.73 CA1 (0.33) MEN1KMT2A
SCHEMBL3830490 0.72 ALDH1A1 (0.34) ALDH1A1MEN1KMT2APOLBSMN1; SMN2
SCHEMBL547766 0.72 ALDH1A1 (0.53) ALDH1A1TDP1MEN1KMT2AHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7341817-B2 Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition FUJIFILM CORPORATION (JP) 2008-03-11 US disclosed