Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | HTT | P42858 | 3/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14001494 | 0.83 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL4827266 | 0.80 | USP2 (0.30) | TSHRUSP2 | |
| SCHEMBL14448181 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL14491491 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL107102 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL14564324 | 0.79 | ALDH1A1 (0.46) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL3425529 | 0.78 | ALDH1A1 (0.44) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL14287556 | 0.78 | ALDH1A1 (0.44) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL12110782 | 0.78 | ALDH1A1 (0.45) | ALDH1A1TDP1MEN1KMT2AHTT | |
| SCHEMBL8459640 | 0.77 | ALDH1A1 (0.55) | ALDH1A1TDP1MEN1KMT2AHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12036078-B2 | Oral products and methods for producing the same | PolySpectra, Inc. (US) | 2024-07-16 | — | — | US | disclosed |
| US-20240030030-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240021429-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION | JSR CORPORATION (JP) | 2024-01-18 | — | — | US | disclosed |
| US-11725077-B2 | Olefin metathesis photopolymers | PolySpectra, Inc. (US) | 2023-08-15 | — | — | US | disclosed |
| CN-106795384-B | Dispersed carbon-coated metal particles, articles and uses | 柯达公司 | 2020-10-30 | — | — | CN | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| US-10000701-B2 | Cured-film formation composition, orientation material, and retardation material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-06-19 | — | — | US | disclosed |
| US-20180112032-A1 | CURED FILM FORMATION COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-04-26 | — | — | US | disclosed |
| US-9897913-B2 | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9823400-B2 | Cured film formation composition, orientation material, and retardation material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20110159252-A1 | Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices | NATIONAL SCIENCE FOUNDATION | 2011-06-30 | — | — | US | disclosed |
| US-7838466-B2 | Device for chemical and biochemical reactions using photo-generated reagents | THE REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2010-11-23 | — | — | US | disclosed |
| WO-2010067898-A2 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | WO | disclosed |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-02-25 | — | — | US | disclosed |
| WO-2010007910-A1 | NOVEL SULFONIC ACID SALT AND DERIVATIVE THEREOF, PHOTO-ACID GENERATOR, AND PROCESS FOR PRODUCTION OF SULFONIC ACID SALT | セントラル硝子株式会社 (JP) | 2010-01-21 | — | — | WO | disclosed |
| US-20090263631-A1 | FILM FORMING COMPOSITION FOR NANOIMPRINTING AND METHOD FOR PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| EP-2080750-A1 | RADIATION-SENSITIVE COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2009-07-22 | — | — | EP | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-6677101-B2 | REACTIVITY, RIGIDITY AND ADHESION TO THE SUBSTRATE, AND UNDERGOES A LOW DEGREE OF SWELLING DURING DEVELOPMENT; RESOLUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-01-13 | — | — | US | disclosed |
| US-20020132182-A1 | Polymers, resist materials, and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110159252-A1 | Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices | FRG1, RARG, NPM1 | ALDH1A1 2340/4885TDP1 2344/4885MEN1 3146/4885 |
| US-20100047709-A1 | RADIATION-SENSITIVE COMPOSITION | C1S, C9, RAD51 | ALDH1A1 1078/4885TDP1 3283/4885MEN1 1910/4885 |
| US-12036078-B2 | Oral products and methods for producing the same | CROCC, RPAP1, RUVBL1 | ALDH1A1 4171/4885TDP1 1727/4885MEN1 2874/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.