Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 2/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | THRB | P10828 | 1/20 | 0.57 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.57 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.49 |
| ▸ | CYP19A1 | P11511 | 3/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3506539 | 1.00 | ALOX15 (0.64) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL8737958 | 1.00 | ALOX15 (0.64) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL14841540 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL1773862 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL19718040 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL24534431 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL18138230 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL19718041 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL17836881 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 | |
| SCHEMBL30250115 | 0.81 | ALOX15 (0.65) | ALOX15ALDH1A1LMNATHRBMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024175295-A1 | DETERGENTS AND CLEANING AGENTS COMPRISING DISPERSIN AND FRAGRANCE | HENKEL AG & CO. KGAA (DE) | 2024-08-29 | — | — | WO | claimed |
| US-20240041725-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | PROCTER & GAMBLE (US) | 2024-02-08 | — | — | US | claimed |
| EP-4255375-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | The Procter & Gamble Company (US) | 2023-10-11 | — | — | EP | claimed |
| US-20220175640-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | THE PROCTER & GAMBLE COMPANY | 2022-06-09 | — | — | US | claimed |
| WO-2022120109-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | THE PROCTER & GAMBLE COMPANY (US) | 2022-06-09 | — | — | WO | claimed |
| EP-4255375-B1 | HAIR CARE COMPOSITION COMPRISING MALODOR REDUCTION MATERIALS | PROCTER & GAMBLE (US) | 2025-08-13 | — | — | EP | disclosed |
| WO-2024175295-A1 | DETERGENTS AND CLEANING AGENTS COMPRISING DISPERSIN AND FRAGRANCE | HENKEL AG & CO. KGAA (DE) | 2024-08-29 | — | — | WO | disclosed |
| US-20240041725-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | PROCTER & GAMBLE (US) | 2024-02-08 | — | — | US | disclosed |
| US-11819474-B2 | Hair care compositions comprising malodor reduction materials | THE PROCTER & GAMBLE COMPANY (US) | 2023-11-21 | — | — | US | disclosed |
| EP-4255375-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | The Procter & Gamble Company (US) | 2023-10-11 | — | — | EP | disclosed |
| EP-2069471-B2 | DETERGENT OR CLEANING MATERIAL DISPENSING SYSTEM | HENKEL AG & CO KGAA (DE) | 2022-08-10 | — | — | EP | disclosed |
| WO-2022120109-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | THE PROCTER & GAMBLE COMPANY (US) | 2022-06-09 | — | — | WO | disclosed |
| US-20220175640-A1 | HAIR CARE COMPOSITIONS COMPRISING MALODOR REDUCTION MATERIALS | THE PROCTER & GAMBLE COMPANY | 2022-06-09 | — | — | US | disclosed |
| CN-112739804-A | Fabric softener composition | 塔明克公司 | 2021-04-30 | — | — | CN | disclosed |
| US-7344821-B2 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-03-18 | — | — | US | disclosed |