SCHEMBL14306348

SCHEMBL14306348

OC(Cl)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A2 O15244 2/20 0.44
SLC47A1 Q96FL8 2/20 0.44
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
MAPT P10636 1/20 0.42
LMNA P02545 3/20 0.41
GRIN2D O15399 2/20 0.41
GRIN3B O60391 2/20 0.41
GRIN1 Q05586 2/20 0.41
GRIN2A Q12879 2/20 0.41
GRIN2B Q13224 2/20 0.41
GRIN2C Q14957 2/20 0.41
GRIN3A Q8TCU5 2/20 0.41
SLC22A1 O15245 1/20 0.41
TSHR P16473 1/20 0.41
NFKB1 P19838 1/20 0.41
STAT6 P42226 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.39
THRB P10828 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4027679 0.77 SLC22A2 (0.48) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL28929390 0.77 SLC22A2 (0.48) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL3813603 0.74 KMT2A (0.48) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL182779 0.72 SLC22A2 (0.56) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL27514830 0.72 SLC22A2 (0.44) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL7739624 0.72 SLC22A2 (0.56) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL3180369 0.72 MEN1 (0.47) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL7442387 0.72 MEN1 (0.47) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL7445771 0.72 MEN1 (0.47) SLC22A2SLC47A1MEN1KMT2AMAPT
SCHEMBL2965277 0.72 KMT2A (0.47) SLC22A2SLC47A1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012173282-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-12-20 WO disclosed